A Study of an Ion Flow of a Combined Vacuum and Surface Discharge Plasma

2011 ◽  
Vol 39 (6) ◽  
pp. 1398-1402
Author(s):  
Ilya Lvovich Muzyukin
Keyword(s):  
Discharge Plasma ◽  
Surface Discharge ◽  
Ion Flow

Frequency Dependence on Etching Characteristics of Silicon using Surface Discharge Plasma

2012 ◽  
Vol 132 (4) ◽  
pp. 333-334
Author(s):  
Takuya Arimura ◽  
Keta Hirano ◽  
Toshiyuki Hamada ◽  
Tatsuya Sakoda
Keyword(s):  
Frequency Dependence ◽  
Discharge Plasma ◽  
Surface Discharge

Persulfate activation in gas phase surface discharge plasma for synergetic removal of antibiotic in water

2018 ◽  
Vol 337 ◽  
pp. 446-454 ◽  
Author(s):  
Shoufeng Tang ◽  
Deling Yuan ◽  
Yandi Rao ◽  
Na Li ◽  
Jinbang Qi ◽  
...  
Keyword(s):  
Gas Phase ◽  
Discharge Plasma ◽  
Surface Discharge ◽  
Persulfate Activation ◽  
Phase Surface

Investigation on properties of surface discharge plasma induced shockwave

2015 ◽  
Vol 27 (6) ◽  
pp. 61008
Author(s):  
沈炎龙 Shen Yanlong ◽  
于力 Yu Li ◽  
栾昆鹏 Luan Kunpeng ◽  
黄超 Huang Chao
Keyword(s):  
Discharge Plasma ◽  
Surface Discharge

scholarly journals Etching Characteristics of SixNy Film on Textured Single Crystalline Silicon Surface Using Ar/CF4 and He/CF4 Surface-Discharge Plasma

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 563
Author(s):  
Toshiyuki Hamada ◽  
Shunsuke Masuda ◽  
Kazuki Nishida ◽  
Soma Yamamoto
Keyword(s):  
Silicon Nitride ◽  
Applied Voltage ◽  
Silicon Surface ◽  
Discharge Plasma ◽  
Crystalline Silicon ◽  
Surface Discharge ◽  
Etching Time ◽  
Single Crystalline Silicon ◽  
Single Crystalline ◽  
Carrier Gas

In this study, we investigated the characteristics of electrode grooves formed by etching silicon nitride (SixNy) films using surface-discharge plasma under Ar/CF4 and He/CF4 gases on the basis of differences in the widths of the electrode grooves etched on the SixNy film. The widths of the grooves etched using Ar as the carrier gas were narrower than those etched using He, and the etching speed achieved using Ar was higher than that achieved using He. Furthermore, the electrode groove created by surface-discharge plasma gradually widened as etching time and applied voltage increased.

Surface discharge plasma actuator driven by a pulsed 13.56 MHz–5 kHz voltage waveform

2013 ◽  
Vol 46 (40) ◽  
pp. 405201 ◽  
Author(s):  
J Dedrick ◽  
S Im ◽  
M A Cappelli ◽  
R W Boswell ◽  
C Charles
Keyword(s):  
Discharge Plasma ◽  
Plasma Actuator ◽  
Surface Discharge ◽  
Voltage Waveform
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