Reactor Scale Model of Multiwalled Carbon Nanotube Growth in a Tube Flow Chemical Vapor Deposition Reactor

Computational Models ◽

Chemical Vapor ◽

Scale Model ◽

Tube Flow ◽

Multiwalled Carbon ◽

Carbon Nanotube Growth ◽

Even though a large number of applications for multiwalled carbon nanotubes have been proposed, there is relatively limited knowledge about the optimal conditions in which to create multiwalled carbon nanotubes (MWNTs). Computational models have been shown to be a promising tool to determine the best carbon nanotube growth conditions. In this paper the growth of MWNTs in a tube flow CVD reactor was studied through the use of the commercial software package COMSOL, where details steps have been described to reformulate an existing single walled carbon nanotube (SWNT) growth model to accommodate MWNTs followed by validation and growth rate prediction. Higher growth rates were predicted for MWNTs than SWNTs which is a result of the increase in pathways for carbon to form carbon nanotubes based on the additional walls. Results indicate that selecting the correct number of walls can be important to the results of the model.

Multiwalled Carbon Nanotube Growth Mechanism on Conductive and Non-Conductive Barriers

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.403-408.1201 ◽

2011 ◽

Vol 403-408 ◽

pp. 1201-1204 ◽

Cited By ~ 1

Author(s):

Aun Shih Teh ◽

Daniel C.S. Bien ◽

Rahimah Mohd Saman ◽

Soo Kien Chen ◽

Kai Sin Tan ◽

...

Keyword(s):

Carbon Nanotubes ◽

Growth Mechanism ◽

Growth Rates ◽

Tip Growth ◽

Chemical Vapor ◽

Multiwalled Carbon ◽

Co Catalyst ◽

Carbon Nanotube Growth ◽

We report on the catalytic growth of multiwalled carbon nanotubes by plasma enhanced chemical vapor deposition using Ni and Co catalyst deposited on SiO2, Si3N 4,ITO and TiN Xbarrier layers; layers which are typically used as diffusive barriers of the catalyst material. Results revealed higher growth rates on conductive ITO and TiN Xas compared to non con-ductiveSiO2, and Si3N 4,barriers. Micrograph images reveal the growth mechanism for nanotubes grown on SiO2, Si3N 4 and ITO to be tip growth while base growth was observed for the TiN X barrier layer. Initial conclusion suggests that conductive diffusion barrier surfaces promotes growth rates however it is possible that multiwalled carbon nanotubes grown onSiO2, and Si3N 4,were encumbered as a result of the formation of silicide as shown in the results here.

Functionalisation of Microfluidic Channels with In Situ Grown Carbon Nanotubes

MRS Proceedings ◽

10.1557/proc-872-j18.10 ◽

2005 ◽

Vol 872 ◽

Author(s):

K. Gjerde ◽

T. Schurmann ◽

K.B.K. Teo ◽

M. Aono ◽

W.I. Milne ◽

...

Keyword(s):

Carbon Nanotubes ◽

Carbon Nanotube ◽

Surface Properties ◽

Microfluidic Channels ◽

Electrical Field ◽

Multiwalled Carbon ◽

Carbon Nanotube Growth ◽

Nanotube Growth ◽

Local Distortions

AbstractWe present a new route towards customizing the surface properties of microfluidic channels, by a forest of in situ grown multiwalled carbon nanotubes (CNT). Local distortions of the electrical field direction are used to control the direction of the carbon nanotube growth.

Multi-Walled Carbon Nanotube Growth in Multi-Walled Carbon Nanotubes by Chemical Vapor Deposition

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2015.9030 ◽

2015 ◽

Vol 15 (2) ◽

pp. 1801-1804 ◽

Cited By ~ 1

Author(s):

Takayuki Hasegawa ◽

Daniel. J. Arenas ◽

Hideo Kohno

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multi Walled Carbon Nanotube ◽

Multi Walled Carbon Nanotubes ◽

Carbon Nanotube Growth ◽

Nanotube Growth ◽

Walled Carbon Nanotubes

Growth of Carbon Nanotubes on Copper Substrates Using a Nickel Thin Film Catalyst

MRS Proceedings ◽

10.1557/proc-1204-k05-19 ◽

2009 ◽

Vol 1204 ◽

Cited By ~ 1

Author(s):

Gowtam Atthipalli ◽

Prashant Kumta ◽

Wei Wang ◽

Rigved Epur ◽

Prashanth H Jampani ◽

...

Keyword(s):

Thin Film ◽

Carbon Nanotubes ◽

Carbon Nanotube ◽

Nickel Catalyst ◽

High Vacuum ◽

Chemical Vapor ◽

Ultra High Vacuum ◽

Thin Film Catalyst ◽

Carbon Nanotube Growth ◽

AbstractCarbon nanotubes with their attractive properties, one-dimensional character, and their large aspect ratio are ideal candidates for a variety of applications including energy storage, sensing, nanoelectronics, among others. We have studied the growth of carbon nanotubes on copper substrates using a nickel thin film as a catalyst. The catalyst was sputtered in a chamber having a base pressure in the ultra-high-vacuum regime. By adjusting the sputtering parameters, the effects of the morphology and the thickness of the nickel catalyst on the growth of carbon nanotubes have also been investigated. Multiple hydrocarbon sources as carbon feedstock (methane, acetylene and xylene) and corresponding catalyst precursors and varying temperature conditions were used during the Chemical Vapor Deposition (CVD) process to understand and best determine the ideal conditions for carbon nanotube growth on copper. Correlation between the thickness of the thin film nickel catalyst and the carbon nanotube diameter is also presented in the study. Characterization techniques used to study the morphology of the CNTs grown on copper include SEM, TEM and HRTEM, Raman Spectroscopy

Mechanisms for Catalytic CVD Growth of Multiwalled Carbon Nanotubes

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2008.sw02 ◽

2008 ◽

Vol 8 (11) ◽

pp. 6054-6064 ◽

Cited By ~ 20

Author(s):

Navdeep Bajwa ◽

Xuesong Li ◽

Pulickel M. Ajayan ◽

Robert Vajtai

Keyword(s):

Carbon Nanotubes ◽

Review Paper ◽

Chemical Vapor ◽

Multiwalled Carbon ◽

Chemical Vapor Deposition Growth ◽

Complete Knowledge ◽

Cvd Growth ◽

Carbon nanotubes possess unique properties that make them potentially ideal materials for various technological applications. However, a basic growth mechanism explaining the way metallic atoms interact with carbon to nucleate, grow and heal CNTs still needs to be understood. In this review paper we describe the mechanisms of catalytic chemical vapor deposition growth of multiwalled carbon nanotubes and carbon nanofibers, the role of various parameters that govern their growth kinetics and the knowledge added to singlewalled nanotube growth. We also examine future strategies needed to reveal complete knowledge of the growth mechanisms of carbon nanotubes.

Numerical Simulation of Multiwalled Carbon Nanotube Growth in a Tube Flow Chemical Vapor Deposition Reactor

2010 14th International Heat Transfer Conference, Volume 6 ◽

10.1115/ihtc14-22605 ◽

2010 ◽

Author(s):

Jeffrey J. Lombardo ◽

Wilson K. S. Chiu

Keyword(s):

Particle Size ◽

Vapor Deposition ◽

Chemical Vapor ◽

Tube Flow ◽

Expected Number ◽

Multiwalled Carbon ◽

Chemical Vapor Deposition Reactor ◽

Different Temperatures ◽

Carbon Nanotube Growth ◽

The deposition rate of carbon nanotubes in a tube flow CVD reactor was studied over different temperatures and inlet gas concentrations with a focus on particle size and the number nanotube walls per particle. It was found that larger particles and higher numbers of walls increased the use of carbon and required a higher concentration of the carbon feedstock gas, methane. These results show that optimizing reactor conditions will require tailoring the feedstock gas concentrations according to the particle size and expected number of walls per nanotube in order to ensure that there is enough carbon to facilitate nanotube forming reactions.

Neuron-like polyelectrolyte–carbon nanotube composites for ultra-high loading of metal nanoparticles

New Journal of Chemistry ◽

10.1039/c4nj00638k ◽

2014 ◽

Vol 38 (10) ◽

pp. 4799-4806 ◽

Cited By ~ 2

Author(s):

Md. Shahinul Islam ◽

Won San Choi ◽

Tae Sung Bae ◽

Young Boo Lee ◽

Ha-Jin Lee

Keyword(s):

Carbon Nanotubes ◽

Carbon Nanotube ◽

Metal Nanoparticles ◽

High Loading ◽

Multiwalled Carbon ◽

Simple Protocol ◽

Nanotube Composites ◽

Carbon Nanotube Composites

We report a simple protocol for the fabrication of multiwalled carbon nanotubes (MWCNTs) with a neuron-like structure for loading ultra-high densities of metal nanoparticles (NPs).