Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering

2001 ◽  
Vol 19 (1) ◽  
pp. 171-174 ◽  
Author(s):  
F.-J. Haug ◽  
Zs. Geller ◽  
H. Zogg ◽  
A. N. Tiwari ◽  
C. Vignali
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thermal Stability Of ◽  
Deposition Conditions

Thermal stability of ZnO thin film prepared by RF-magnetron sputtering evaluated by thermal desorption spectroscopy

2010 ◽  
Vol 256 (21) ◽  
pp. 6350-6353 ◽  
Author(s):  
Tokiyoshi Matsuda ◽  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Hiroshi Furuta ◽  
Chaoyang Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Thermal Desorption ◽  
Thermal Desorption Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film ◽  
Thermal Stability Of

scholarly journals Thermal stability of high-kSi-rich HfO2layers grown by RF magnetron sputtering

2010 ◽  
Vol 21 (28) ◽  
pp. 285707 ◽  
Author(s):  
L Khomenkova ◽  
X Portier ◽  
J Cardin ◽  
F Gourbilleau
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thermal Stability Of

scholarly journals Structure and Thermal Stability of the Chemical Bondings of Diamond-Like Carbon (DLC) Films Prepared by RF Magnetron Sputtering

Hyomen Kagaku ◽  
2003 ◽  
Vol 24 (7) ◽  
pp. 411-416 ◽  
Author(s):  
Takamasa MIKAMI ◽  
Hideki NAKAZAWA ◽  
Yoshiharu ENTA ◽  
Maki SUEMITSU ◽  
Masao MASHITA
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Diamond Like Carbon ◽  
Thermal Stability Of

Thermal stability of magneto-optical properties in TbFeCo films prepared by rf-magnetron sputtering

1998 ◽  
Author(s):  
Rui Xiong ◽  
Zuoyi Li ◽  
Xiaofei Yang ◽  
Zuoqi Hu ◽  
Zheng Li ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thermal Stability Of

Optical properties and thermal stability of TiAlN/AlON tandem absorber prepared by reactive DC/RF magnetron sputtering

2008 ◽  
Vol 92 (11) ◽  
pp. 1425-1433 ◽  
Author(s):  
Harish C. Barshilia ◽  
N. Selvakumar ◽  
K.S. Rajam ◽  
A. Biswas
Keyword(s):  
Thermal Stability ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thermal Stability Of

Thermal stability of copper nitride films prepared by rf magnetron sputtering

1998 ◽  
Vol 325 (1-2) ◽  
pp. 55-59 ◽  
Author(s):  
Z.Q Liu ◽  
W.J Wang ◽  
T.M Wang ◽  
S Chao ◽  
S.K Zheng
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Copper Nitride ◽  
Thermal Stability Of

Structural properties and thermal stability of Fe/Al2O3 multilayers

1995 ◽  
Vol 10 (12) ◽  
pp. 3062-3067 ◽  
Author(s):  
O. Lenoble ◽  
J.F. Bobo ◽  
H. Fischer ◽  
Ph. Bauer ◽  
M.F. Ravet ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Grazing Incidence ◽  
Rf Magnetron Sputtering ◽  
Tubular Furnace ◽  
Phase Determination ◽  
X Ray ◽  
X Ray Scattering ◽  
Bcc Phase ◽  
Thermal Stability Of

Iron/alumina multilayers have been deposited on sapphire wafers using RF magnetron sputtering. To study the interdiffusion, the multilayers were annealed in a tubular furnace under a 10−7 mbar vacuum, and the samples examined by using a combination of classical diffractometry (θ/2θ) and Grazing Incidence Scattering (GIS) for the phase determination, and Small Angle X-ray Scattering (SAXS) for the superstructure of the multilayers. In all cases, in the as-deposited state the alumina is amorphous and the iron is crystalline in the bcc phase. Thermal anneals at temperatures between 573 and 873 K give evidence for segregation to the interfaces. At higher temperatures, interdiffusion occurs, leading to the formation of different phases. The Fe-Al2O3 interdiffusion coefficient has been evaluated in the temperature range from 873 to 1273 K.

Influence of oxygen atmosphere annealing on the thermal stability of Mn1.2Co1.5Ni0.3O4± ceramic films fabricated by RF magnetron sputtering

2018 ◽  
Vol 44 (2) ◽  
pp. 1455-1460 ◽  
Author(s):  
Wenwen Kong ◽  
Junhua Wang ◽  
Jincheng Yao ◽  
Aimin Chang
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxygen Atmosphere ◽  
Ceramic Films ◽  
Thermal Stability Of

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

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