scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

scholarly journals Thermal stability of tantalum nitride based thin film resistors

2019 ◽  
Vol 498 ◽  
pp. 012014
Author(s):  
S A Shostachenko ◽  
R V Zakharchenko ◽  
R V Ryzhuk ◽  
S V Leshchev
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Tantalum Nitride ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Thermal stability of ZnO thin film prepared by RF-magnetron sputtering evaluated by thermal desorption spectroscopy

2010 ◽  
Vol 256 (21) ◽  
pp. 6350-6353 ◽  
Author(s):  
Tokiyoshi Matsuda ◽  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Hiroshi Furuta ◽  
Chaoyang Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Thermal Desorption ◽  
Thermal Desorption Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film ◽  
Thermal Stability Of

Characterization of Tantalum Nitride Thin Films Deposited on SiO[sub 2]∕Si Substrates Using dc Magnetron Sputtering for Thin Film Resistors

2006 ◽  
Vol 153 (2) ◽  
pp. G164 ◽  
Author(s):  
Nguyen Duy Cuong ◽  
Dong-Jin Kim ◽  
Byoung-Don Kang ◽  
Chang Soo Kim ◽  
Kwang-Min Yu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Tantalum Nitride ◽  
Dc Magnetron Sputtering ◽  
Si Substrates ◽  
Thin Film Resistors

Study of the thermal stability of carbon nitride thin films prepared by reactive magnetron sputtering

2000 ◽  
Vol 9 (2) ◽  
pp. 212-218 ◽  
Author(s):  
C. Fernández-Ramos ◽  
M.J. Sayagués ◽  
T.C. Rojas ◽  
M.D. Alcalá ◽  
C. Real ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Nanocrystallization in magnetron sputtered Zr–Cu–Al–Ag thin film metallic glasses

CrystEngComm ◽  
2014 ◽  
Vol 16 (13) ◽  
pp. 2835-2844 ◽  
Author(s):  
S. Thanka Rajan ◽  
A. K. Nanda Kumar ◽  
B. Subramanian
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Metallic Glasses ◽  
Amorphous Matrix ◽  
Dc Magnetron Sputtering ◽  
Characterization Techniques ◽  
Thermal Stability Of ◽  
Glassy Coating

Zr-based thin film metallic glasses (TFMG) were fabricated from a polycrystalline Zr48Cu36Al8Ag8 (at.%) target by DC magnetron sputtering. A series of characterization techniques were employed to study the structure, composition and thermal stability of the glassy coating. Annealing studies show nanocrystallites of CuZr2 in an amorphous matrix.

Sign in / Sign up

Export Citation Format

Share Document