Structural properties and thermal stability of Fe/Al2O3 multilayers

1995 ◽  
Vol 10 (12) ◽  
pp. 3062-3067 ◽  
Author(s):  
O. Lenoble ◽  
J.F. Bobo ◽  
H. Fischer ◽  
Ph. Bauer ◽  
M.F. Ravet ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Grazing Incidence ◽  
Rf Magnetron Sputtering ◽  
Tubular Furnace ◽  
Phase Determination ◽  
X Ray ◽  
X Ray Scattering ◽  
Bcc Phase ◽  
Thermal Stability Of

Iron/alumina multilayers have been deposited on sapphire wafers using RF magnetron sputtering. To study the interdiffusion, the multilayers were annealed in a tubular furnace under a 10−7 mbar vacuum, and the samples examined by using a combination of classical diffractometry (θ/2θ) and Grazing Incidence Scattering (GIS) for the phase determination, and Small Angle X-ray Scattering (SAXS) for the superstructure of the multilayers. In all cases, in the as-deposited state the alumina is amorphous and the iron is crystalline in the bcc phase. Thermal anneals at temperatures between 573 and 873 K give evidence for segregation to the interfaces. At higher temperatures, interdiffusion occurs, leading to the formation of different phases. The Fe-Al2O3 interdiffusion coefficient has been evaluated in the temperature range from 873 to 1273 K.

Thermal Stability and Internal Stress for Strongly (111) Oriented Cu Films

2003 ◽  
Vol 795 ◽  
Author(s):  
Sinji Takayama ◽  
Makato Oikawa ◽  
Tokuji Himuro
Keyword(s):  
Thermal Stability ◽  
Strain Distribution ◽  
Film Surface ◽  
Grazing Incidence ◽  
Internal Stresses ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cu Films ◽  
X Ray Scattering ◽  
Thermal Stability Of

ABSTRACTInternal stresses and thermal stability of strongly (111) oriented Cu thin films, which are one of promising interconnect materials in advanced ULSI devices, have been studied comparing with those of non-oriented Cu films. Their internal stresses parallel to a film surface were measured by a conventional X-ray diffraction technique (d-spacing vs. sin2ψ method), while the strain distribution with depth by a grazing incidence X-ray scattering (GIXS) methods. Large stress relaxation in strongly (111) oriented Cu films takes place at 200°C without showing any significant grain growth and formation of thermal defects like hillocks. The residual internal stresses of highly oriented (111) Cu films increase almost linearly throughout the thickness up to the substrates. The feature of stress distribution in film depth does not change on annealing. The changes of the residual stresses at each depth are nearly the same as stresses parallel to film surface measured.

Sodium dodecyl sulfate (SDS) effect on the thermal stability of oxy-HbGp: Dynamic light scattering (DLS) and small angle X-ray scattering (SAXS) studies

2013 ◽  
Vol 111 ◽  
pp. 561-570 ◽  
Author(s):  
José Wilson P. Carvalho ◽  
Fernanda Rosa Alves ◽  
Tatiana Batista ◽  
Francisco Adriano O. Carvalho ◽  
Patrícia S. Santiago ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Light Scattering ◽  
Sodium Dodecyl Sulfate ◽  
Dynamic Light Scattering ◽  
Small Angle ◽  
Sodium Dodecyl ◽  
X Ray ◽  
X Ray Scattering ◽  
Dodecyl Sulfate ◽  
Thermal Stability Of

The formation and characterization of three-dimensional gold nanocrystal superlattices

2007 ◽  
Vol 222 (11/2007) ◽  
Author(s):  
Michael G. Constantinides ◽  
Heinrich M. Jaeger ◽  
Xuefa Li ◽  
Jin Wang ◽  
Xiao-Min Lin
Keyword(s):  
Thermal Stability ◽  
Three Dimensional ◽  
Grazing Incidence ◽  
Gold Nanocrystals ◽  
X Ray ◽  
X Ray Scattering ◽  
Drop Drying ◽  
Nanocrystal Superlattices ◽  
Gold Nanocrystal

Highly-ordered, three-dimensional superlattices were self-assembled from dodecanethiol-ligated gold nanocrystals using a simple drop-drying technique. The superlattices had the shape of truncated pyramids (frustums) and reached lateral dimensions of several micrometers. The formation and thermal stability were studied by grazing-incidence small-angle x-ray scattering. We found that the superlattice frustums adopt a

Thermal stability of ZnO thin film prepared by RF-magnetron sputtering evaluated by thermal desorption spectroscopy

2010 ◽  
Vol 256 (21) ◽  
pp. 6350-6353 ◽  
Author(s):  
Tokiyoshi Matsuda ◽  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Hiroshi Furuta ◽  
Chaoyang Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Thermal Desorption ◽  
Thermal Desorption Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film ◽  
Thermal Stability Of

scholarly journals Thermal unequilibrium of strained black CsPbI3 thin films

Science ◽  
2019 ◽  
Vol 365 (6454) ◽  
pp. 679-684 ◽  
Author(s):  
Julian A. Steele ◽  
Handong Jin ◽  
Iurii Dovgaliuk ◽  
Robert F. Berger ◽  
Tom Braeckevelt ◽  
...  
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Optoelectronic Devices ◽  
Grazing Incidence ◽  
Optically Active ◽  
Wide Angle ◽  
Biaxial Strain ◽  
X Ray ◽  
X Ray Scattering ◽  
Thermal Stability Of

The high-temperature, all-inorganic CsPbI3 perovskite black phase is metastable relative to its yellow, nonperovskite phase at room temperature. Because only the black phase is optically active, this represents an impediment for the use of CsPbI3 in optoelectronic devices. We report the use of substrate clamping and biaxial strain to render black-phase CsPbI3 thin films stable at room temperature. We used synchrotron-based, grazing incidence, wide-angle x-ray scattering to track the introduction of crystal distortions and strain-driven texture formation within black CsPbI3 thin films when they were cooled after annealing at 330°C. The thermal stability of black CsPbI3 thin films is vastly improved by the strained interface, a response verified by ab initio thermodynamic modeling.

SOFT X-RAY REFLECTIVITY AND THERMAL STABILITY OF CoCr/C MULTILAYER X-RAY MIRRORS

2002 ◽  
Vol 09 (01) ◽  
pp. 593-596 ◽  
Author(s):  
H. TAKENAKA ◽  
K. NAGAI ◽  
H. ITO ◽  
S. ICHIMARU ◽  
T. SAKUMA ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Critical Parameter ◽  
Incident Angle ◽  
Wavelength Region ◽  
Normal Incidence ◽  
Photoemission Spectroscopy ◽  
Multilayer Mirrors ◽  
X Ray ◽  
Thermal Stability Of

The development of highly reflective multilayer mirrors for use in the wavelength region around 6 nm is desired for X-ray photoemission spectroscopy for inner-shell excitation using a Schwarzschild objective. For this application, reflectivity is the most critical parameter determining the performance of multilayer mirrors, because the reflectivity of multilayers in the 6 nm region is generally very low. We have designed CoCr/C multilayer mirrors with a comparatively high reflectivity at around normal incidence and have fabricated them by magnetron sputtering. The measured peak reflectivity is about 16% at a wavelength of around 6 nm and an incident angle of 88°. The reflectivity remains almost constant for 4 h under 300°C in an Ar atmosphere.

scholarly journals Thermal stability of high-kSi-rich HfO2layers grown by RF magnetron sputtering

2010 ◽  
Vol 21 (28) ◽  
pp. 285707 ◽  
Author(s):  
L Khomenkova ◽  
X Portier ◽  
J Cardin ◽  
F Gourbilleau
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thermal Stability Of

Thermal stability of RuO2, BaxSr1−xTiO3/RuO2, and BaxSr1−xTiO3/Pt/Ti/SiO2on Si(100)

2000 ◽  
Vol 15 (9) ◽  
pp. 1955-1961 ◽  
Author(s):  
T. S. Kang ◽  
Y. S. Kim ◽  
Jung Ho Je
Keyword(s):  
Thermal Stability ◽  
Three Dimensional ◽  
Interface Roughness ◽  
Ex Situ ◽  
X Ray ◽  
Good Thermal Stability ◽  
X Ray Scattering ◽  
Thermal Stability Of ◽  
Ray Scattering

The thermal stability of RuO2/Si(100) films in air was studied using ex situ synchrotron x-ray scattering. The (110) textured RuO2 film showed good thermal stability due to the low surface and strain energies. However, the RuO2 films of high strain and surface energies were transformed to three-dimensional islands during annealing up to 800 °C. We also studied, during the post annealing process, the interface roughness of BaxSr1−xTiO3 (BST)/RuO2/Si(100) and BST/Pt/Ti/SiO2/Si(100) structures comparatively, using in situ synchrotron x-ray scattering. The interfaces of the BST/RuO2/Si were thermally stable up to 500 °C, and the deterioration of the interfaces above 500 °C was attributed to the crystallization of amorphous BST film. Meanwhile, the interfaces of the BST/Pt/Ti/SiO2/Si were significantly degraded even at the low temperature of 350 °C, mainly due to the formation of the Pt–Ti alloy and the Ti oxidation.

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