INFLUENCE OF DEPOSITION PARAMETERS ON THE STRUCTURE AND THERMAL STABILITY OF Ti-Al-N COATINGS PRODUCED BY REACTIVE MAGNETRON SPUTTERING

2015 ◽  
Vol 19 (2) ◽  
pp. 105-112
Author(s):  
F. F. Komarov ◽  
Iryna M. Klimovich ◽  
O. V. Korolik ◽  
V. A. Zaikov ◽  
O. R. Lyudchik
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Deposition Parameters ◽  
Thermal Stability Of

Study of the thermal stability of carbon nitride thin films prepared by reactive magnetron sputtering

2000 ◽  
Vol 9 (2) ◽  
pp. 212-218 ◽  
Author(s):  
C. Fernández-Ramos ◽  
M.J. Sayagués ◽  
T.C. Rojas ◽  
M.D. Alcalá ◽  
C. Real ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering

2010 ◽  
Vol 257 (3) ◽  
pp. 1058-1062 ◽  
Author(s):  
J. Musil ◽  
J. Blažek ◽  
P. Zeman ◽  
Š. Prokšová ◽  
M. Šašek ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Al2o3 Phase ◽  
Thermal Stability Of

Thermal Stability of TiZrAlN and TiZrSiN Films Formed by Reactive Magnetron Sputtering

2018 ◽  
Vol 9 (3) ◽  
pp. 418-426 ◽  
Author(s):  
G. Abadias ◽  
A. Yu. Daniliuk ◽  
I. A. Solodukhin ◽  
V. V. Uglov ◽  
S. V. Zlotsky
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

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