Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering

2001 ◽  
Vol 19 (5) ◽  
pp. 2043-2047 ◽  
Author(s):  
S. K. Choi ◽  
J. I. Lee
Keyword(s):  
Electrical Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Film Density ◽  
Dc Magnetron Reactive Sputtering ◽  
Tin Oxide Films

Depth Profiling of Oxygen Concentration of Indium Tin Oxide Films Fabricated by Reactive Sputtering

1994 ◽  
Vol 33 (Part 2, No. 9A) ◽  
pp. L1257-L1260 ◽  
Author(s):  
Shinichi Honda ◽  
Akira Tsujimoto ◽  
Michio Watamori ◽  
Kenjiro Oura
Keyword(s):  
Oxygen Concentration ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Depth Profiling ◽  
Reactive Sputtering ◽  
Tin Oxide Films

Indium tin oxide films made from nanoparticles: models for the optical and electrical properties

2003 ◽  
Vol 445 (2) ◽  
pp. 199-206 ◽  
Author(s):  
J Ederth ◽  
P Heszler ◽  
A Hultåker ◽  
G.A Niklasson ◽  
C.G Granqvist
Keyword(s):  
Electrical Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Optical And Electrical Properties ◽  
Tin Oxide Films

Effects of Oxygen Gas Annealing on Electrical Properties and Internal Stress in Indium Tin Oxide Films

2002 ◽  
Vol 41 (Part 2, No. 6A) ◽  
pp. L619-L621 ◽  
Author(s):  
Shinji Takayama ◽  
Akira Tanaka ◽  
Toshifumi Sugawara ◽  
Tokuji Himuro
Keyword(s):  
Electrical Properties ◽  
Internal Stress ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Oxygen Gas ◽  
Tin Oxide Films
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