Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. I. Experimental characterization of polysilicon profiles
2002 ◽
Vol 20
(3)
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pp. 1055
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2012 ◽
Vol 69
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pp. 2-8
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Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 7B)
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pp. 4268-4274
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2016 ◽
Vol 26
(3)
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pp. 235-255
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