High-performance n-channel 13.56MHz plasma-enhanced chemical vapor deposition nanocrystalline silicon thin-film transistors
2006 ◽
Vol 24
(3)
◽
pp. 618-623
◽
1991 ◽
2001 ◽
Vol 395
(1-2)
◽
pp. 330-334
◽
1997 ◽
Vol 36
(Part 1, No. 7A)
◽
pp. 4278-4282
◽
1990 ◽
Vol 110
(10)
◽
pp. 659-666
Keyword(s):
2008 ◽
Vol 47
(12)
◽
pp. 8700-8706
◽