Characterization of Polycrystalline Silicon Thin Film Transistors Fabricated by Ultrahigh-Vacuum Chemical Vapor Deposition and Chemical Mechanical Polishing

1997 ◽  
Vol 36 (Part 1, No. 7A) ◽  
pp. 4278-4282 ◽  
Author(s):  
Hsiao-Yi Lin ◽  
Chun-Yen Chang ◽  
Tan Fu Lei ◽  
Juing-Yi Cheng ◽  
Hua-Chou Tseng ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Mechanical Polishing ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Silicon Thin Film

High performance amorphous-silicon thin film transistors prepared by catalytic chemical vapor deposition with high deposition rate

2001 ◽  
Vol 395 (1-2) ◽  
pp. 330-334 ◽  
Author(s):  
Masahiro Sakai ◽  
Takayuki Tsutsumi ◽  
Tatsuo Yoshioka ◽  
Atsushi Masuda ◽  
Hideki Matsumura
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Deposition Rate ◽  
Vapor Deposition ◽  
Thin Film Transistors ◽  
High Performance ◽  
Chemical Vapor ◽  
High Deposition Rate ◽  
Silicon Thin Film
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