Batch-Process for High Performance Amorphous-Silicon Thin-Film Transistors Using Hot-Wall Chemical-Vapor-Deposition Method
2001 ◽
Vol 395
(1-2)
◽
pp. 330-334
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2006 ◽
Vol 24
(3)
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pp. 618-623
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2011 ◽
Vol 50
(1S2)
◽
pp. 01BG05
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2011 ◽
Vol 50
◽
pp. 01BG05
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2000 ◽
Vol 18
(4)
◽
pp. 1595-1598
◽
2019 ◽
Vol 358
◽
pp. 715-720
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2009 ◽
Vol 54
(1)
◽
pp. 194-199
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