Characterizations of InN films on Si(111) substrate grown by metal-organic chemical vapor deposition with a predeposited In layer and a two-step growth method
2007 ◽
Vol 25
(4)
◽
pp. 701-705
◽
2013 ◽
Vol 31
(5)
◽
pp. 051211
◽
2007 ◽
Vol 298
◽
pp. 228-231
◽
2016 ◽
Vol 16
(5)
◽
pp. 5168-5172
◽
2000 ◽
Vol 7
(1)
◽
pp. 12
2021 ◽
Vol 15
(6)
◽
pp. 2170024