Summary Abstract: Diagnostics of low‐pressure oxygen radio‐frequency plasmas and the mechanism for polymer etching: A comparison of reactive sputter etching and magnetron sputter etching
1986 ◽
Vol 4
(3)
◽
pp. 1798-1799
◽
1986 ◽
Vol 14
(2)
◽
pp. 137-144
◽
1978 ◽
Vol 82
(17)
◽
pp. 1869-1875
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