X‐ray photoemission study of SF6/O2 triode reactive ion etching of polycrystalline silicon, silicon dioxide, and their interface

1992 ◽  
Vol 10 (5) ◽  
pp. 3039-3047 ◽  
Author(s):  
J. H. Thomas ◽  
B. Singh
Keyword(s):  
Silicon Dioxide ◽  
Polycrystalline Silicon ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
X Ray ◽  
Photoemission Study ◽  
Silicon Silicon

Reactive ion etching of multilayer mirrors for X-ray projection lithography masks

1991 ◽  
Vol 13 (1-4) ◽  
pp. 283-286 ◽  
Author(s):  
C.Khan Malek ◽  
F.R. Ladan ◽  
M. Carré ◽  
R. Rivoira
Keyword(s):  
Reactive Ion Etching ◽  
Multilayer Mirrors ◽  
Ion Etching ◽  
X Ray ◽  
Projection Lithography ◽  
Ray Projection

X‐ray photoelectron study of the reactive ion etching of SixGe1−x alloys in SF6 plasmas

1996 ◽  
Vol 14 (1) ◽  
pp. 156-164 ◽  
Author(s):  
M. C. Peignon ◽  
Ch. Cardinaud ◽  
G. Turban ◽  
C. Charles ◽  
R. W. Boswell
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
X Ray ◽  
Photoelectron Study

Reactive Ion Etching Of Silicon Dioxide

1987 ◽  
Author(s):  
Peter C. Sukanek ◽  
Glynis Sullivan
Keyword(s):  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Ion Etching
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