Directional emission of plastic luminescent films using photonic crystals fabricated by soft-X-ray interference lithography and reactive ion etching

Qiang Wu; Bo Liu; Zhichao Zhu; Mu Gu; Hong Chen; Chaofan Xue; Jun Zhao; Yanqing Wu; Renzhong Tai; Xiaoping Ouyang

doi:10.1038/s41598-018-27593-w

Directional emission of plastic luminescent films using photonic crystals fabricated by soft-X-ray interference lithography and reactive ion etching

Scientific Reports ◽

10.1038/s41598-018-27593-w ◽

2018 ◽

Vol 8 (1) ◽

Cited By ~ 4

Author(s):

Qiang Wu ◽

Bo Liu ◽

Zhichao Zhu ◽

Mu Gu ◽

Hong Chen ◽

...

Keyword(s):

Photonic Crystals ◽

Reactive Ion Etching ◽

Interference Lithography ◽

Ion Etching ◽

X Ray ◽

Directional Emission ◽

Luminescent Films

Get full-text (via PubEx)

X-ray zone plates fabricated using electron beam lithography and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583242 ◽

1985 ◽

Vol 3 (1) ◽

pp. 265 ◽

Cited By ~ 6

Author(s):

H. Aritome

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Zone Plates

Get full-text (via PubEx)

Fabrication of a two-dimensional photonic crystals using reactive ion etching

2008 11th IEEE Singapore International Conference on Communication Systems ◽

10.1109/iccs.2008.4737379 ◽

2008 ◽

Author(s):

Jingtao Zhou ◽

Huajun Shen ◽

Huihui Zhang ◽

Xinyu Liu

Keyword(s):

Photonic Crystals ◽

Reactive Ion Etching ◽

Two Dimensional ◽

Ion Etching

Get full-text (via PubEx)

X-ray photoelectron spectroscopy analyses of silicon dioxide contact holes etched in a magnetically enhanced reactive ion etching reactor

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590008 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1051 ◽

Cited By ~ 16

Author(s):

P. Czuprynski

Keyword(s):

Silicon Dioxide ◽

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray

Get full-text (via PubEx)

Study of Reactive Ion Etching of the Si3 N 4 / GaAs Interface in CF 4 Plasmas by X‐Ray Photoelectron Spectroscopy and X‐Ray Photoelectron Diffraction

Journal of The Electrochemical Society ◽

10.1149/1.2097363 ◽

1989 ◽

Vol 136 (8) ◽

pp. 2361-2367 ◽

Cited By ~ 8

Author(s):

P. Alnot ◽

J. Olivier ◽

F. Wyczisk ◽

R. Joubard

Keyword(s):

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Photoelectron Diffraction

Get full-text (via PubEx)

Grinding and chemical mechanical polishing process for micropore x-ray optics fabricated with deep reactive ion etching

Applied Optics ◽

10.1364/ao.58.005240 ◽

2019 ◽

Vol 58 (19) ◽

pp. 5240 ◽

Cited By ~ 1

Author(s):

Aoto Fukushima ◽

Maiko Fujitani ◽

Kumi Ishikawa ◽

Masaki Numazawa ◽

Daiki Ishi ◽

...

Keyword(s):

Chemical Mechanical Polishing ◽

Reactive Ion Etching ◽

Mechanical Polishing ◽

Polishing Process ◽

Ion Etching ◽

Ray Optics ◽

Deep Reactive Ion Etching ◽

X Ray ◽

Chemical Mechanical Polishing Process

Get full-text (via PubEx)

Three-dimensional photonic crystals developed by double-angled reactive-ion etching technique

2009 IEEE LEOS Annual Meeting Conference Proceedings ◽

10.1109/leos.2009.5343486 ◽

2009 ◽

Author(s):

Katsuyoshi Suzuki ◽

Shigeki Takahashi ◽

Makoto Okano ◽

Masahiro Imada ◽

Kenji Ishizaki ◽

...

Keyword(s):

Photonic Crystals ◽

Reactive Ion Etching ◽

Three Dimensional ◽

Etching Technique ◽

Ion Etching

Get full-text (via PubEx)

Reactive ion etching of multilayer mirrors for X-ray projection lithography masks

Microelectronic Engineering ◽

10.1016/0167-9317(91)90094-t ◽

1991 ◽

Vol 13 (1-4) ◽

pp. 283-286 ◽

Cited By ~ 4

Author(s):

C.Khan Malek ◽

F.R. Ladan ◽

M. Carré ◽

R. Rivoira

Keyword(s):

Reactive Ion Etching ◽

Multilayer Mirrors ◽

Ion Etching ◽

X Ray ◽

Projection Lithography ◽

Ray Projection

Get full-text (via PubEx)

X‐ray photoelectron study of the reactive ion etching of SixGe1−x alloys in SF6 plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579913 ◽

1996 ◽

Vol 14 (1) ◽

pp. 156-164 ◽

Cited By ~ 19

Author(s):

M. C. Peignon ◽

Ch. Cardinaud ◽

G. Turban ◽

C. Charles ◽

R. W. Boswell

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Photoelectron Study

Get full-text (via PubEx)

High quality semicontinuous deep reactive ion etching of silicon for the creation of x-ray lenses

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4982712 ◽

2017 ◽

Vol 35 (3) ◽

pp. 031206 ◽

Cited By ~ 2

Author(s):

Karola Richter ◽

André Mocker ◽

Johann-Wolfgang Bartha

Keyword(s):

Reactive Ion Etching ◽

High Quality ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

X Ray ◽

The Creation

Get full-text (via PubEx)

Fabrication of PDMS Nano-Stamp by Replicating Si Nano-Moulds Fabricated by Interference Lithography

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.516.25 ◽

2012 ◽

Vol 516 ◽

pp. 25-29 ◽

Cited By ~ 2

Author(s):

Ikjoo Byun ◽

Jong Ho Park ◽

Joon Won Kim ◽

Beom Joon Kim

Keyword(s):

Reactive Ion Etching ◽

Superhydrophobic Surfaces ◽

Interference Lithography ◽

Adhesion Layer ◽

Self Assembled Monolayer ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Self Assembled ◽

Si Nanostructures

In this research, a polydimethylsiloxane nanostamp for nanocontact printing was fabricated by replicating Si nanomoulds. Si moulds of various shapes and sizes were fabricated by interference lithography and deep reactive ion etching. As an anti-adhesion layer, octadecyltrichlorosilane was treated on Si nanomoulds. Further, superhydrophobic surfaces were obtained by self-assembled monolayer treatment on Si nanostructures.

Get full-text (via PubEx)