Improvement of electrostatic lenses for ion beam lithography

1983 ◽  
Vol 1 (4) ◽  
pp. 1137 ◽  
Author(s):  
M. Szilagyi
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography ◽  
Electrostatic Lenses

scholarly journals Ion-beam lithography by use of highly charged Ar-ion beam

2006 ◽  
Vol 77 (3) ◽  
pp. 03C111 ◽  
Author(s):  
Sadao Momota ◽  
Shingo Iwamitsu ◽  
Shougo Goto ◽  
Yoichi Nojiri ◽  
Jun Taniguchi ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography

Large-Scale Focused Helium Ion Beam Lithography

2021 ◽  
Vol 31 (5) ◽  
pp. 1-4
Author(s):  
Jay C. LeFebvre ◽  
Shane A. Cybart
Keyword(s):  
Large Scale ◽  
Ion Beam ◽  
Ion Beam Lithography ◽  
Helium Ion

Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

2012 ◽  
Vol 272 ◽  
pp. 149-152 ◽  
Author(s):  
Nitipon Puttaraksa ◽  
Somrit Unai ◽  
Michael W. Rhodes ◽  
Kanda Singkarat ◽  
Harry J. Whitlow ◽  
...  
Keyword(s):  
Soft Lithography ◽  
Ion Beam ◽  
Master Mold ◽  
Ion Beam Lithography

Maskless ion beam lithography system

1999 ◽  
Vol 46 (1-4) ◽  
pp. 469-472 ◽  
Author(s):  
Y. Lee ◽  
R.A. Gough ◽  
T.J. King ◽  
Q. Ji ◽  
K.N. Leung ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography ◽  
Lithography System

Microstructures of GaAs fabricated by finely focused ion beam lithography

1989 ◽  
Vol 9 (1-4) ◽  
pp. 277-279 ◽  
Author(s):  
Takao Shiokawa ◽  
Pil Hyon Kim ◽  
Manabu Hamagaki ◽  
Tamio Hara ◽  
Yoshinobu Aoyagi ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Beam Lithography

High energy heavy ion beam lithography in silicon

2007 ◽  
Vol 261 (1-2) ◽  
pp. 731-735 ◽  
Author(s):  
Bibhudutta Rout ◽  
Alexander D. Dymnikov ◽  
Daniel P. Zachry ◽  
Elia V. Eschenazi ◽  
Yongqiang Q. Wang ◽  
...  
Keyword(s):  
Ion Beam ◽  
Heavy Ion ◽  
High Energy ◽  
Ion Beam Lithography ◽  
Heavy Ion Beam

Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography

2007 ◽  
Vol 18 (46) ◽  
pp. 465302 ◽  
Author(s):  
Ali Ozhan Altun ◽  
Jun-Ho Jeong ◽  
Jong-Joo Rha ◽  
Ki-Don Kim ◽  
Eung-Sug Lee
Keyword(s):  
Boron Nitride ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Ultra Violet ◽  
Ion Beam Lithography

Fabrication of Sub-250nm High Aspect Ratio Apertures by Focused Ion Beam Lithography

2006 ◽  
Vol 983 ◽  
Author(s):  
Todd Simpson ◽  
Ian V Mitchell
Keyword(s):  
Silicon Nitride ◽  
High Resolution ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Gold Films ◽  
Ion Beam Lithography ◽  
Diameter Hole ◽  
Sem Imaging ◽  
Aperture Arrays

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

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