Fabrication of Sub-250nm High Aspect Ratio Apertures by Focused Ion Beam Lithography

2006 ◽  
Vol 983 ◽  
Author(s):  
Todd Simpson ◽  
Ian V Mitchell

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

1988 ◽  
Vol 53 (10) ◽  
pp. 868-870 ◽  
Author(s):  
Shinji Matsui ◽  
Yoshikatsu Kojima ◽  
Yukinori Ochiai

MRS Bulletin ◽  
2007 ◽  
Vol 32 (5) ◽  
pp. 417-423 ◽  
Author(s):  
Richard M. Langford ◽  
Philipp M. Nellen ◽  
Jacques Gierak ◽  
Yongqi Fu

AbstractThis article discusses applications of focused ion beam micro- and nanofabrication. Emphasis is placed on illustrating the versatility of focused ion beam and dual-platform systems and how they complement conventional processing techniques. The article is divided into four parts: maskless milling, ion beam lithography, ion implantation, and techniques such as in situ micromanipulation.


1996 ◽  
Vol 227 (1-4) ◽  
pp. 264-267 ◽  
Author(s):  
G.A.C. Jones ◽  
P.D. Rose ◽  
E.H. Linfield ◽  
D.A. Ritchie

1992 ◽  
Vol 279 ◽  
Author(s):  
R. L. Kubena

ABSTRACTWe have recently demonstrated the ability to focus a 50-keV Ga+ beam to an 8-nm-diameter spot diameter. This ultra-high resolution probe has been used to study the resolution limits of conventional resists for focused-ion-beam lithography. Lines and dots in poly (methylmethacrylate) resist as small as 7–8 nm have been formed with high throughput. In addition, no proximity effects have been observed for 25 to 30-nm size features on high-z substrates. However, for the smallest geometries obtainable, the pattern fidelity and resolution are most likely limited by ion scattering effects and statistical dose fluctuations. The use of lighter ions (such as He, Li, or Be) with lower sensitivity resists should, in principle, allow focused-ion-beam lithography to be extended to the sub-5 nm regime.


2021 ◽  
Author(s):  
Nadav Scher ◽  
Katya Rechav ◽  
Perrine Paul-Gilloteaux ◽  
Ori Avinoam

Imaging of cells and tissues has improved significantly over the last decade. Dual-beam instruments with a focused ion beam mounted on a scanning electron microscope (FIB-SEM), which offer high-resolution 3D imaging of large volumes and fields-of-view are becoming widely used in the life sciences. FIB-SEM has most recently been implemented on fully hydrated, cryo-immobilized, biological samples. However, correlative light and electron microscopy (CLEM) workflows combining cryo- fluorescence microscopy (cryo-FM) and FIB-SEM are not yet commonly available. Here, we demonstrate that fluorescently labeled lipid droplets can serve as in-situ fiducial markers for correlating cryo- FM and FIB-SEM datasets, and that this approach can be used to target the acquisition of large FIB-SEM stacks spanning tens of microns under cryogenic conditions. We also show that cryo-FIB-SEM imaging is particularly informative for questions related to organelle structure and inter-organellar contacts, nuclear organization and mineral deposits in cells.


1990 ◽  
Vol 11 (1-4) ◽  
pp. 427-430 ◽  
Author(s):  
Shinji Matsui ◽  
Yoshikatsu Kojima ◽  
Yukinori Ochiai ◽  
Toshiyuki Honda ◽  
Katsumi Suzuki

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