Operational characteristics of SF6 etching in an electron cyclotron resonance plasma reactor

Author(s):  
J. L. Cecchi
1990 ◽  
Vol 57 (12) ◽  
pp. 1188-1190 ◽  
Author(s):  
Dennis J. Trevor ◽  
Nader Sadeghi ◽  
Toshiki Nakano ◽  
Jacques Derouard ◽  
Richard A. Gottscho ◽  
...  

2017 ◽  
Vol 57 (1S) ◽  
pp. 01AA04
Author(s):  
Camille Faith Romero ◽  
Keita Kanamori ◽  
Michikazu Kinsho ◽  
Masahiro Yoshimoto ◽  
Motoi Wada

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