Operational characteristics of SF6 etching in an electron cyclotron resonance plasma reactor
1991 ◽
Vol 9
(2)
◽
pp. 318
◽
1993 ◽
Vol 64
(12)
◽
pp. 3572-3584
◽
2014 ◽
Vol 85
(3)
◽
pp. 033310
◽
1991 ◽
Vol 9
(6)
◽
pp. 3521
◽
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
1991 ◽
Vol 9
(6)
◽
pp. 3113-3118
◽
1993 ◽
Vol 11
(6)
◽
pp. 2897-2902
◽