Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor.
1991 ◽
Vol 9
(2)
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pp. 318
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1993 ◽
Vol 64
(12)
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pp. 3572-3584
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1996 ◽
Vol 73
(3)
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pp. 487-502
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2014 ◽
Vol 85
(3)
◽
pp. 033310
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1991 ◽
Vol 9
(6)
◽
pp. 3521
◽
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
1991 ◽
Vol 9
(6)
◽
pp. 3113-3118
◽
2003 ◽
Vol 21
(4)
◽
pp. 1511
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