Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

Field Emission ◽

Hydrogen Content ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer By Layer ◽

Diamondlike Carbon ◽

Layer Technique ◽

Layer By Layer Technique

Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

9th International Vacuum Microelectronics Conference ◽

10.1109/ivmc.1996.601822 ◽

2002 ◽

Cited By ~ 2

Author(s):

Kyu Chang Park ◽

Jong Hyun Moon ◽

Suk Jae Chung ◽

Myung Hwan Oh ◽

W.I. Milne ◽

...

Keyword(s):

Field Emission ◽

Hydrogen Content ◽

Layer By Layer ◽

Layer Technique ◽

Layer By Layer Technique

Structural and electrical characterization of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system

Journal of Applied Physics ◽

10.1063/1.372076 ◽

2000 ◽

Vol 87 (4) ◽

pp. 1676-1680 ◽

Cited By ~ 8

Author(s):

J. P. Hong ◽

C. O. Kim ◽

T. U. Nahm ◽

C. M. Kim

Keyword(s):

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Silicon Films ◽

Layer By Layer ◽

Microcrystalline Silicon ◽

Layer Technique ◽

Layer By Layer Technique

Erratum to: “Field-emission characteristics of chemical vapor deposition-diamond films”

Thin Solid Films ◽

10.1016/s0040-6090(00)01076-2 ◽

2000 ◽

Vol 372 (1-2) ◽

pp. 292-299 ◽

Cited By ~ 4

Author(s):

X.L. Peng

Keyword(s):

Field Emission ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

Field emission from carbon nanotubes grown by layer-by-layer deposition method using plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01617-5 ◽

2001 ◽

Vol 383 (1-2) ◽

pp. 73-77 ◽

Cited By ~ 15

Author(s):

Suk Jae Chung ◽

Sung Hoon ◽

Lim Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer By Layer ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Layer Deposition

Enhanced field emission characteristics of nitrogen-doped carbon nanotube films grown by microwave plasma enhanced chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2006.07.016 ◽

2006 ◽

Vol 515 (4) ◽

pp. 1851-1856 ◽

Cited By ~ 73

Author(s):

Sanjay K. Srivastava ◽

V.D. Vankar ◽

D.V. Sridhar Rao ◽

Vikram Kumar

Keyword(s):

Carbon Nanotube ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

Nitrogen Doped ◽

Nitrogen Doped Carbon

Relationship between hydrogen content and magnetic properties of diamondlike carbon produced by the rf plasma-enhanced chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.3359711 ◽

2010 ◽

Vol 107 (7) ◽

pp. 073522 ◽

Cited By ~ 4

Author(s):

Tetsuji Saito ◽

Keiichi Terashima ◽

Yoshio Utsushikawa

Keyword(s):

Magnetic Properties ◽

Hydrogen Content ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rf Plasma ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Diamondlike Carbon

P-37: Field Emission from Carbon Nanotubes Grown by Layer-by-layer Deposition Method Using Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833036 ◽

2000 ◽

Vol 31 (1) ◽

pp. 666 ◽

Cited By ~ 1

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer By Layer ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Layer Deposition

Field Emission Characteristics and Growth Analysis of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2003.16.12s.1248 ◽

2003 ◽

Vol 16 (12S) ◽

pp. 1248-1254

Keyword(s):

Carbon Nanotubes ◽

Field Emission ◽

Vapor Deposition ◽

Growth Analysis ◽

Chemical Vapor ◽

Emission Characteristics

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Field emission characteristics of multiwalled carbon nanotubes grown at low temperatures using electron cyclotron resonance chemical vapor deposition

10.1116/1.1580116 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1660 ◽

Cited By ~ 9

Author(s):

Yun Sung Woo ◽

Duk Young Jeon ◽

In Taek Han ◽

Young Jun Park ◽

Ha Jin Kim ◽

...

Keyword(s):

Carbon Nanotubes ◽

Field Emission ◽

Vapor Deposition ◽

Low Temperatures ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Multiwalled Carbon

Electron field emission characteristics of planar diamond film array synthesized by chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.119607 ◽

1997 ◽

Vol 71 (4) ◽

pp. 554-556 ◽

Cited By ~ 25

Author(s):

J. S. Lee ◽

K. S. Liu ◽

I. N. Lin

Keyword(s):

Field Emission ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Electron Field Emission ◽

Electron Field