Real time monitoring and control of wet etching of GaAs/Al[sub 0.3]Ga[sub 0.7]As using real time spectroscopic ellipsometry
1999 ◽
Vol 17
(5)
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pp. 2045
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2015 ◽
Vol 3
(2)
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pp. 9-22
2020 ◽
Vol 286
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pp. 116832
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1976 ◽
Vol 14
(6)
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pp. 274-278
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