Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry

1998 ◽  
Vol 313-314 ◽  
pp. 490-495 ◽  
Author(s):  
B Johs ◽  
C Herzinger ◽  
J.H Dinan ◽  
A Cornfeld ◽  
J.D Benson ◽  
...  
2019 ◽  
Vol 80 ◽  
pp. 138-145 ◽  
Author(s):  
Fuduo Ma ◽  
An Zhang ◽  
David Chang ◽  
Orlin D. Velev ◽  
Kelly Wiltberger ◽  
...  

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