Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture

2022 ◽  
Vol 40 (1) ◽  
pp. 010604
Author(s):  
Eun Taek Lim ◽  
Sung Yong Park ◽  
Ji Soo Lee ◽  
Seung Hyun Kim ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Acetic Acid ◽  
High Density ◽  
Nanometer Scale ◽  
Gas Mixture ◽  
Argon Gas ◽  
Density Plasma

Etch characteristics of copper thin films in high density plasma of CH4/O2/Ar gas mixture

2018 ◽  
Vol 665 ◽  
pp. 51-58 ◽  
Author(s):  
Eun Taek Lim ◽  
Jin Su Ryu ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
High Density ◽  
Gas Mixture ◽  
Ar Gas ◽  
Density Plasma

High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture

2015 ◽  
Vol 587 ◽  
pp. 28-33 ◽  
Author(s):  
Su Min Hwang ◽  
Adrian Adalberto Garay ◽  
Wan In Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
High Density ◽  
Gas Mixture ◽  
Ion Etching ◽  
Density Plasma

Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma

2018 ◽  
Vol 18 (9) ◽  
pp. 968-974 ◽  
Author(s):  
Doo Hyeon Cho ◽  
Jae Yong Lee ◽  
Jae Sang Choi ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
High Density ◽  
Nanometer Scale ◽  
Density Plasma

Nanometer-sized patterning of polysilicon thin films by high density plasma etching

2004 ◽  
Vol 467 (1-2) ◽  
pp. 172-175 ◽  
Author(s):  
Young Soo Song ◽  
Jung Woo Kim ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Plasma Etching ◽  
High Density ◽  
Density Plasma

Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma

2004 ◽  
Vol 201 (8) ◽  
pp. 1644-1647 ◽  
Author(s):  
Byul Shin ◽  
Young Soo Song ◽  
Sang Jin Park ◽  
Tae Wan Kim ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Magnetic Thin Films ◽  
High Density ◽  
Density Plasma
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