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Investigation on helium ion beam lithography with proximity effect correction
Journal of Micro/Nanopatterning, Materials, and Metrology
◽
10.1117/1.jmm.20.3.033201
◽
2021
◽
Vol 20
(03)
◽
Author(s):
Chien-Lin Lee
◽
Sheng-Wei Chien
◽
Kuen-Yu Tsai
◽
Chun-Hung Liu
Keyword(s):
Proximity Effect
◽
Ion Beam
◽
Ion Beam Lithography
◽
Helium Ion
◽
Proximity Effect Correction
Download Full-text
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Model-based proximity effect correction for helium ion beam lithography
Novel Patterning Technologies 2018
◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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Large-Scale Focused Helium Ion Beam Lithography
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◽
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◽
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◽
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(5)
◽
pp. 1-4
Author(s):
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◽
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Keyword(s):
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◽
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◽
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◽
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Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical dose
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◽
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◽
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◽
Vol 18
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◽
pp. 3177
◽
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Author(s):
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◽
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Keyword(s):
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◽
Absorbed Energy
◽
Ion Beam Lithography
◽
Critical Dose
◽
Energy Gradient
◽
Helium Ion
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Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist
Microelectronic Engineering
◽
10.1016/j.mee.2018.02.015
◽
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◽
Vol 193
◽
pp. 18-22
◽
Cited By ~ 11
Author(s):
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◽
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◽
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◽
Marco Faustini
◽
Gediminas Seniutinas
◽
...
Keyword(s):
Ion Beam
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Ion Beam Lithography
◽
Helium Ion
Download Full-text
Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
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◽
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◽
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◽
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◽
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Ion Beam
◽
Dose Optimization
◽
Ion Beam Lithography
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Nanoaperture fabrication in ultra-smooth single-grain gold films with helium ion beam lithography
Nanotechnology
◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
C Kyle Renshaw
◽
...
Keyword(s):
Ion Beam
◽
Gold Films
◽
Ion Beam Lithography
◽
Helium Ion
◽
Single Grain
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Precision fabrication of EUVL programmed defects with helium ion beam lithography
International Conference on Extreme Ultraviolet Lithography 2019
◽
10.1117/12.2536874
◽
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◽
Author(s):
Chien-Lin Lee
◽
Jia-Syun Cai
◽
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◽
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Keyword(s):
Ion Beam
◽
Ion Beam Lithography
◽
Helium Ion
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Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography
ACS Applied Materials & Interfaces
◽
10.1021/acsami.9b21414
◽
2020
◽
Vol 12
(17)
◽
pp. 19616-19624
◽
Cited By ~ 4
Author(s):
Rudra Kumar
◽
Manvendra Chauhan
◽
Mohamad G. Moinuddin
◽
Satinder K. Sharma
◽
Kenneth E. Gonsalves
Keyword(s):
Electron Beam
◽
Metal Oxide
◽
Ion Beam
◽
Oxide Cluster
◽
Ion Beam Lithography
◽
Helium Ion
◽
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◽
Negative Tone
Download Full-text
Direct visualization of beam-resist interaction volume for sub-nanometer helium ion beam lithography
Nanotechnology
◽
10.1088/1361-6528/ac1099
◽
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◽
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◽
Xin Zhuang
◽
Wu Wang
◽
Rui Gu
◽
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◽
...
Keyword(s):
Ion Beam
◽
Direct Visualization
◽
Interaction Volume
◽
Ion Beam Lithography
◽
Helium Ion
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Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning
Microelectronic Engineering
◽
10.1016/j.mee.2016.02.045
◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
Alex P.G. Robinson
◽
...
Keyword(s):
Ion Beam
◽
Ion Beam Lithography
◽
Helium Ion
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