High-detection resolution presented by large-area thin-film position-sensitive detectors

Author(s):  
Elvira Fortunato ◽  
Guilherme Lavareda ◽  
Rodrigo Martins ◽  
Fernando Soares ◽  
Luis Fernandes
1995 ◽  
Vol 377 ◽  
Author(s):  
R. Martins ◽  
G. Lavareda ◽  
F. Soares ◽  
E. Fortunato

ABSTRACTThe aim of this work is to provide the basis for the interpretation of the steady state lateral photoeffect observed in p-i-n a-Si:H ID Thin Film Position Sensitive Detectors (ID TFPSD). The experimental data recorded in ID TFPSD devices with different performances are compared with the predicted curves and the obtained correlation's discussed.


2001 ◽  
Vol 383 (1-2) ◽  
pp. 310-313 ◽  
Author(s):  
E. Fortunato ◽  
D. Brida ◽  
I. Ferreira ◽  
H. Águas ◽  
P. Nunes ◽  
...  

2000 ◽  
Vol 86 (3) ◽  
pp. 182-186 ◽  
Author(s):  
Elvira Fortunato ◽  
Isabel Ferreira ◽  
Franco Giuliani ◽  
Rodrigo Martins

1996 ◽  
Vol 272 (1) ◽  
pp. 148-156 ◽  
Author(s):  
Elvira Fortunato ◽  
Guilherme Lavareda ◽  
Fernando Soares ◽  
Rodrigo Martins

1995 ◽  
Vol 51 (2-3) ◽  
pp. 135-142 ◽  
Author(s):  
Elvira Fortunato ◽  
Guilherme Lavareda ◽  
Rodrigo Martins ◽  
Fernando Soares ◽  
Luís Fernandes

2000 ◽  
Vol 609 ◽  
Author(s):  
Elvira M.C. Fortunato ◽  
Donatello Brida ◽  
Isabel M.M. Ferreira ◽  
H. M.B. Åguas ◽  
Patrícia Nunes ◽  
...  

ABSTRACTLarge area thin film position sensitive detectors based on amorphous silicon technology have been prepared on polyimide substrates using the conventional plasma enhanced chemical vapour deposition technique. The sensors have been characterised by spectral response, illuminated I-V characteristics and position detectability measurements. The obtained one dimensional position sensors with 5 mm wide and 60 mm long present a maximum spectral response at 600 nm, an open circuit voltage of 0.6 V and a position detectability with a correlation of 0.9989 associated to a standard deviation of 1×10−2, comparable to those ones produced on glass substrates. The surface of the sensors at each stage of fabrication was investigated by Atomic Force Microscopy.


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