The study of CD side to side error in line/space pattern caused by post-exposure bake effect

2016 ◽  
Author(s):  
Jin Huang ◽  
Eric Guo ◽  
Haiming Ge ◽  
Max Lu ◽  
Yijun Wu ◽  
...  
Keyword(s):  
Post Exposure ◽  
Space Pattern ◽  
Post Exposure Bake ◽  
Side Error ◽  
Line Space

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

2015 ◽  
Author(s):  
HsinYu Tsai ◽  
Hiroyuki Miyazoe ◽  
Joy Cheng ◽  
Markus Brink ◽  
Simon Dawes ◽  
...  
Keyword(s):  
Self Assembly ◽  
Space Pattern ◽  
Line Space

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

2009 ◽  
Vol 9 (1) ◽  
pp. 562-566 ◽  
Author(s):  
Miyako Shizuno ◽  
Jun Taniguchi ◽  
Kenta Ogino ◽  
Kiyoshi Ishikawa
Keyword(s):  
Electron Beam ◽  
Post Exposure ◽  
Post Exposure Bake

Examination Of The Mechanism Of The Post Exposure Bake Effect

1988 ◽  
Author(s):  
P. Trefonas III ◽  
B. K. Daniels ◽  
M. J. Eller ◽  
A. Zampini
Keyword(s):  
Post Exposure ◽  
Post Exposure Bake

Evaluation of the new-type ESPACER adopted for its removal after post-exposure bake process

2005 ◽  
Author(s):  
Yoshihiro Saida ◽  
Takashi Okubo ◽  
Jun Sasaki ◽  
Toshio Konishi ◽  
Motohiko Morita
Keyword(s):  
Post Exposure ◽  
New Type ◽  
Post Exposure Bake
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