The future of EUV lithography: enabling Moore's Law in the next decade

2017 ◽  
Author(s):  
Alberto Pirati ◽  
Jan van Schoot ◽  
Kars Troost ◽  
Rob van Ballegoij ◽  
Peter Krabbendam ◽  
...  
Keyword(s):  
Moore’S Law ◽  
Moore's Law ◽  
Euv Lithography ◽  
The Future

The future of EUV lithography: continuing Moore's Law into the next decade

2018 ◽  
Author(s):  
Jan van Schoot ◽  
Kars Troost ◽  
Frank Bornebroek ◽  
Rob van Ballegoij ◽  
Sjoerd Lok ◽  
...  
Keyword(s):  
Moore’S Law ◽  
Moore's Law ◽  
Euv Lithography ◽  
The Future

Application of Probabilistic and Interactive Information in Verifying Machine System and Kernels Based on Relational Modality

2010 ◽  
Vol 143-144 ◽  
pp. 67-71 ◽  
Author(s):  
Dong Ping Li ◽  
Zhi Ming Qu
Keyword(s):  
World Wide Web ◽  
World Wide ◽  
Position Paper ◽  
Current Status ◽  
Moore’S Law ◽  
Moore's Law ◽  
Machine System ◽  
The World ◽  
The Future

The networking approach to the World Wide Web is defined not only by the exploration of architecture, but also by the confirmed need for interrupts. Given the current status of authenticated archetypes, steganographers dubiously desire the analysis of scatter/gather I/O. the focus in this position paper is not on whether Moore's Law can be made concurrent, distributed, and pervasive, but rather on proposing an analysis of 32 bit architectures (Grange). It is concluded that, using probabilistic and interactive information and based on relational modality, the machine system and kernels are verified, which is widely used in the future.

Moore's Law and the Future of Computing

Physics Today ◽  
2000 ◽  
Vol 53 (10) ◽  
pp. 106-108 ◽  
Author(s):  
Igor Fodor ◽  
Stan Williams
Keyword(s):  
Moore’S Law ◽  
Moore's Law ◽  
The Future

scholarly journals Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry

2012 ◽  
Vol 370 (1973) ◽  
pp. 3950-3972 ◽  
Author(s):  
Robert-H. Munnig Schmidt
Keyword(s):  
Integrated Circuit ◽  
Semiconductor Industry ◽  
Atomic Scale ◽  
Precision Engineering ◽  
Exposure System ◽  
Moore’S Law ◽  
Moore's Law ◽  
Positioning Systems ◽  
Motion System ◽  
The Future

The developments in lithographic tools for the production of an integrated circuit (IC) are ruled by ‘Moore’s Law’: the density of components on an IC doubles in about every two years . The corresponding size reduction of the smallest detail in an IC entails several technological breakthroughs. The wafer scanner, the exposure system that defines those details, is the determining factor in these developments. This review deals with those aspects of the positioning systems inside these wafer scanners that enable the extension of Moore’s Law into the future. The design of these systems is increasingly difficult because of the accuracy levels in the sub-nanometre range coupled with motion velocities of several metres per second. In addition to the use of feedback control for the reduction of errors, high-precision model-based feed-forward control is required with an almost ideally reproducible motion-system behaviour and a strict limitation of random disturbing events. The full mastering of this behaviour even includes material drift on an atomic scale and is decisive for the future success of these machines.

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