High LIDT mirrors for 355nm wavelength based on combined ion beam sputtering and glancing angle deposition technique

2017 ◽  
Author(s):  
Giedrius Abromavicius ◽  
Tomas Tolenis ◽  
Lina Grinevičiūtė ◽  
Rytis Buzelis ◽  
Simonas Kicas ◽  
...  
Keyword(s):  
Ion Beam ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Ion Beam Sputtering ◽  
Glancing Angle ◽  
Beam Sputtering ◽  
Angle Deposition

Ordered Si-Ge nanostructures by glancing angle deposition via ion beam sputtering

2011 ◽  
Vol 1329 ◽  
Author(s):  
Jens Bauer ◽  
Michael Weise ◽  
Chinmay Khare ◽  
Bernd Rauschenbach
Keyword(s):  
Temporal Evolution ◽  
Ion Beam ◽  
Glancing Angle Deposition ◽  
Ion Beam Sputtering ◽  
Substrate Preparation ◽  
Sequential Deposition ◽  
Glancing Angle ◽  
Beam Sputtering ◽  
Distinct Morphology ◽  
Angle Deposition

ABSTRACTGlancing angle deposition (GLAD) was used to deposit ordered arrangements of Si/Ge-nanocolumns applying the ion beam sputter technique. After substrate preparation by electron beam lithography as well as nanosphere lithography the deposition behavior of GLAD nanocolumns in regular arrangements with different symmetries was studied. The nanocolumns exhibited distinct morphology regions which are correlated to their temporal evolution during deposition. Furthermore, the customization of the column morphology by non-uniform substrate rotation is considered. Axial Si/Ge-heterojunctions were incorporated by sequential deposition.

scholarly journals Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

2017 ◽  
Vol 49 (1) ◽  
pp. 73-79
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Photoelectron Spectroscopy ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Magneto Optical Kerr Effect ◽  
Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

Fabrication of TiO2-based broadband single-layer anti-reflection coating by collimated glancing angle deposition technique

2021 ◽  
Vol 32 (24) ◽  
pp. 245708
Author(s):  
Rajnarayan De ◽  
S Maidul Haque ◽  
M K Sikdar ◽  
P K Sahoo ◽  
K Divakar Rao
Keyword(s):  
Single Layer ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Glancing Angle ◽  
Angle Deposition

scholarly journals Transparent conductive nanocolumnar AZO film coating by glancing angle deposition technique

2018 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Film Coating ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Glancing Angle ◽  
Angle Deposition

Ion-Beam Assisted Glancing Angle Deposition for Relative Humidity Sensors

2008 ◽  
Vol 8 (9) ◽  
pp. 1521-1522 ◽  
Author(s):  
Michael T. Taschuk ◽  
Jason B. Sorge ◽  
John J. Steele ◽  
Michael J. Brett
Keyword(s):  
Relative Humidity ◽  
Ion Beam ◽  
Glancing Angle Deposition ◽  
Humidity Sensors ◽  
Glancing Angle ◽  
Angle Deposition
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