Ion-Beam Assisted Glancing Angle Deposition for Relative Humidity Sensors

2008 ◽  
Vol 8 (9) ◽  
pp. 1521-1522 ◽  
Author(s):  
Michael T. Taschuk ◽  
Jason B. Sorge ◽  
John J. Steele ◽  
Michael J. Brett
2007 ◽  
Vol 1054 ◽  
Author(s):  
Mike Taschuk ◽  
John Steele ◽  
Mike Brett

ABSTRACTCapacitive humidity sensors were fabricated using interdigitated electrodes coated with amorphous nanostructured TiO2 thin films grown by glancing angle deposition. The sensor exhibited a large change in capacitance, increasing exponentially from ∼ 1 nF to ∼ 1 μF for an increase in relative humidity from 2 % to 92 %. A simple model of the capacitive response and dielectric constant of the devices has been developed and compared to the experimental results. From this comparison, it is clear that the magnitude of the device response observed cannot be explained with bulk dielectric constants or literature values.


2003 ◽  
Vol 788 ◽  
Author(s):  
John J. Steele ◽  
Kenneth D. Harris ◽  
Michael J. Brett

ABSTRACTMiniaturized thin film humidity sensors were fabricated using nanostructured materials deposited by an advanced technique known as glancing angle deposition (GLAD). These sensors exhibited extremely fast desorption response times of less than 40 ms to steplike changes in humidity. Multiple response time measurements for various initial humidities have shown that the sensors maintain their rapid response at all levels of humidity.


2019 ◽  
Vol 8 (2) ◽  
pp. 305-315
Author(s):  
Tobias Ott ◽  
Diego Roldán ◽  
Claudia Redenbach ◽  
Katja Schladitz ◽  
Michael Godehardt ◽  
...  

Abstract. Thin tantalum films generated by glancing angle deposition serve as functional optical layers, for instance as absorption layers for ultrathin infrared sensors. They consist of nano-rods whose dimensions and distribution influence the optical properties of the thin film. Serial sectioning by a focused ion beam combined with scanning electron microscopy of the slices generates stacks of highly resolved images of this nanostructure. Dedicated image processing reconstructs the spatial structure from this stack such that 3-D image analysis yields geometric information that can be related to the optical performance.


2011 ◽  
Vol 1329 ◽  
Author(s):  
Jens Bauer ◽  
Michael Weise ◽  
Chinmay Khare ◽  
Bernd Rauschenbach

ABSTRACTGlancing angle deposition (GLAD) was used to deposit ordered arrangements of Si/Ge-nanocolumns applying the ion beam sputter technique. After substrate preparation by electron beam lithography as well as nanosphere lithography the deposition behavior of GLAD nanocolumns in regular arrangements with different symmetries was studied. The nanocolumns exhibited distinct morphology regions which are correlated to their temporal evolution during deposition. Furthermore, the customization of the column morphology by non-uniform substrate rotation is considered. Axial Si/Ge-heterojunctions were incorporated by sequential deposition.


Sign in / Sign up

Export Citation Format

Share Document