The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Structure of nonionic surfactant diglycerol monomyristate (C14G2) micelles in cyclohexane has been investigated by small-angle X-ray scattering (SAXS) technique. Structural modulation of reverse micelle (RM) has been systematically studied by changing composition, temperature change and added-water. The SAXS data were evaluated by the generalized indirect Fourier transformation (GIFT) method, which gives pair-distance distribution function (PDDF). Unlike conventional poly(oxyethylene) type nonionic surfactants, C14G2 forms RM in cyclohexane without water addition at normal room temperature. A clear indication of one dimensional (1-D) micellar growth was found with increasing C14G2 concentrations. On the other hand, temperature induced cylinder-to-sphere type transition in the RM structure. The maximum dimension and the cross-sectional diameter of the RM increased upon addition of trace water indicating the formation of water pool in the reverse micellar core.Keywords: Diglycerol monomyristate, small-angle X-ray scattering, reverse micelles.DOI: 10.3126/jncs.v23i0.2099J. Nepal Chem. Soc., Vol. 23, 2008/2009Page: 74-81

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Small Angle X-ray Scattering Studies of Polymeric Zirconium Species in Aqueous Solution

MRS Proceedings ◽

10.1557/proc-180-123 ◽

1990 ◽

Vol 180 ◽

Cited By ~ 6

Author(s):

J.A. Jutson ◽

R.M. Richardson ◽

S.L. Jones ◽

C. Norman

Keyword(s):

Aqueous Solution ◽

Particle Size ◽

Small Angle ◽

Cross Sectional ◽

Zirconyl Chloride ◽

X Ray ◽

X Ray Scattering ◽

Varying Length ◽

Shape And Size ◽

Ray Scattering

ABSTRACTSmall angle X-ray scattering techniques have been used to investigate the shape and size distribution of Zr(IV) species in aqueous solution. This study has shown that when zirconyl chloride solutions, containing the zirconyl tetramer, are subjected to various treatments polymerisation occurs. While ageing and addition of base produces an increase in particle size the shape remains globular. Refluxing the solutions produces “rod” like particles of varying length but constant cross sectional radius.

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Flexibility and Cross-Sectional Structure of an Anionic Dual-Surfactant Wormlike Micelle Explored with Small-Angle X-ray Scattering Coupled with Contrast Variation Technique

The Journal of Physical Chemistry B ◽

10.1021/jp9019415 ◽

2009 ◽

Vol 113 (30) ◽

pp. 10222-10229 ◽

Cited By ~ 25

Author(s):

Kenzo Naruse ◽

Kenichi Eguchi ◽

Isamu Akiba ◽

Kazuo Sakurai ◽

Hiroyasu Masunaga ◽

...

Keyword(s):

Small Angle ◽

Contrast Variation ◽

Cross Sectional ◽

X Ray ◽

X Ray Scattering ◽

Wormlike Micelle ◽

Sectional Structure ◽

Variation Technique ◽

Ray Scattering

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Small-angle X-ray scattering investigation of the micellar and submicellar forms of bovine casein

Journal of Dairy Research ◽

10.1017/s0022029900028922 ◽

1989 ◽

Vol 56 (3) ◽

pp. 443-451 ◽

Cited By ~ 22

Author(s):

Helmut Pessen ◽

Thomas F. Kumosinski ◽

Harold M. Farrell

Keyword(s):

Electron Density ◽

Small Angle ◽

Distribution Functions ◽

Spherical Particles ◽

Scattering Data ◽

Cross Sectional ◽

Packing Number ◽

X Ray ◽

X Ray Scattering ◽

Ray Scattering

SummarySmall-angle X-ray scattering was performed on whole casein under submicellar (Ca2+ removed) and micellar (Ca2+ re-added) conditions. Submicellar scattering curves showed two Gaussian components which were interpreted in terms of a spherical particle with two concentric regions of different electron density, a relatively compact core of higher electron density and a looser shell. Normalized scattering curves and calculated distance distribution functions were consistent with this picture. Micellar scattering data, which can yield only cross-sectional information related to a window of scattered intensities, could be analysed by a sum of three Gaussians with no residual function. The two Gaussians with the lower radii of gyration were again taken to indicate the two concentric regions of different electron density of inhomogeneous spherical particles; the third Gaussian was shown to reflect the packing number of these particles within a cross-sectional portion of the micelle, which was 3:1 for this system. These results are a strong indication that submicellar inhomogeneous particles containing hydrophobically stabilized inner cores exist within the colloidal micelle.

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Line Edge Roughness and Cross Sectional Characterization of Sub-50 nm Structures Using Critical Dimension Small Angle X-ray Scattering

10.1063/1.2799407 ◽

2007 ◽

Cited By ~ 1

Author(s):

Chengqing Wang ◽

Ronald L. Jones ◽

Eric K. Lin ◽

Wen-li Wu ◽

Derek L. Ho ◽

...

Keyword(s):

Small Angle ◽

Critical Dimension ◽

Line Edge Roughness ◽

Cross Sectional ◽

X Ray ◽

X Ray Scattering ◽

Edge Roughness ◽

Ray Scattering

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X-Ray Replication of Submicrometer Linewidth Patterns

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100078250 ◽

1977 ◽

Vol 35 ◽

pp. 136-137

Author(s):

Henry I. Smith ◽

D.C. Flanders

Keyword(s):

Electron Beam Lithography ◽

Cross Sectional ◽

X Ray ◽

Electron Backscattering ◽

Spatial Frequencies ◽

Cross Sectional Profile ◽

Carbon Foils ◽

Sectional Profile ◽

And Control ◽

Soft Radiation

Scanning electron beam lithography has been used for a number of years to write submicrometer linewidth patterns in radiation sensitive films (resist films) on substrates. On semi-infinite substrates, electron backscattering severely limits the exposure latitude and control of cross-sectional profile for patterns having fundamental spatial frequencies below about 4000 Å(l),Recently, STEM'S have been used to write patterns with linewidths below 100 Å. To avoid the detrimental effects of electron backscattering however, the substrates had to be carbon foils about 100 Å thick (2,3). X-ray lithography using the very soft radiation in the range 10 - 50 Å avoids the problem of backscattering and thus permits one to replicate on semi-infinite substrates patterns with linewidths of the order of 1000 Å and less, and in addition provides means for controlling cross-sectional profiles. X-radiation in the range 4-10 Å on the other hand is appropriate for replicating patterns in the linewidth range above about 3000 Å, and thus is most appropriate for microelectronic applications (4 - 6).

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