Study of optic and laser-induced damage properties of Ta2O5 films deposited by different process parameters

2019 ◽  
Author(s):  
Houjun Li ◽  
Junhong Su ◽  
Junqi Xu ◽  
Mian Li ◽  
Jian Wang
Keyword(s):  
Process Parameters ◽  
Laser Induced Damage

UHV-TEM studies of laser-induced damage

1991 ◽  
Vol 49 ◽  
pp. 632-633
Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks
Keyword(s):  
Surface Science ◽  
Rapid Heating ◽  
Local Heating ◽  
Routine Practice ◽  
Transmission Electron ◽  
Northwestern University ◽  
Laser Induced Damage ◽  
Set Up ◽  
Focusing Lens ◽  
Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

Halogenation of ORMOSIL: A Promising Rout for Tailoring Optical Absorptions

2003 ◽  
Vol 771 ◽  
Author(s):  
Amir Fardad ◽  
Wei Liang ◽  
Yadong Zhang ◽  
Bryson Case ◽  
Shibin Jiang ◽  
...  
Keyword(s):  
Process Parameters ◽  
Sol Gel ◽  
Fiber Amplifiers ◽  
Grignard Reaction ◽  
Coupling Loss ◽  
Beam Splitters ◽  
Silicon Technology ◽  
Sol Gel Process ◽  
Propagation Losses ◽  
Signal Intensities

AbstractFluorinated and photo-imageable precursors are synthesized through a Barbier-Grignard reaction for 1550-nm window. The precursors are used for the sol-gel process of integrated optic components for silica-on-silicon technology. Material compositions and process parameters are optimized to achieve internal absorptions >0.1 dB/cm and propagation losses of about 0.5 dB/cm at 1550 nm. Compact 1×16 Beam splitters are designed and fabricated which exhibit >0.3 dB power uniformity, >0.1 dB PDL and 1.5 dB coupling loss. By hybrid integration of the passive splitters and in-house fiber amplifiers, amplifying splitters are demonstrated at various signal intensities.

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