Indium and tin oxide multilayered thin films as gas sensors based on reactive pulsed laser deposition

2000 ◽  
Author(s):  
Veronica Marotta ◽  
Stefano Orlando ◽  
Giovanni P. Parisi ◽  
Anna Giardini-Guidoni
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Gas Sensors ◽  
Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Multilayered Thin Films

Pulsed Laser Deposition of Low-Resistivity Indium Tin Oxide Thin Films at Low Substrate Temperature

1999 ◽  
Vol 38 (Part 1, No. 5A) ◽  
pp. 2710-2716 ◽  
Author(s):  
Frederick Ojo Adurodija ◽  
Hirokazu Izumi ◽  
Tsuguo Ishihara ◽  
Hideki Yoshioka ◽  
Hiroshi Matsui ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Low Resistivity

Pulsed Laser Deposition of Bi4Ti3O12 Thin Films on Indium Tin Oxide Coated Glass

1994 ◽  
Vol 343 ◽  
Author(s):  
H-J. Cho ◽  
William Jo ◽  
T. W. Noh
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Leakage Current ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chemical Compositions ◽  
Coated Glass

ABSTRACTBi4Ti3O12 thin films have been grown on indium tin oxide coated glass by pulsed laser deposition. The films are rapidly thermal annealed at 650 °C in various kinds of ambients. X-ray diffraction and scanning electron microscopy are used to investigate crystallization and microstructures, respectively. Using Auger electron microscopy, chemical compositions and depth profiles are examined. Optical and current-voltage characteristics measurements of the films show that their transmittance and leakage current behaviors are strongly dependent upon the microstructures. O2 partial pressure in the rapid thermal annealing process is found to be an important parameter which determines crystallization, microstructures, and leakage current behaviors of the Bi4Ti3O12 thin films.

Pulsed laser deposition of conductive indium tin oxide thin films

2012 ◽  
Vol 48 (10) ◽  
pp. 1020-1025 ◽  
Author(s):  
I. A. Petukhov ◽  
A. N. Shatokhin ◽  
F. N. Putilin ◽  
M. N. Rumyantseva ◽  
V. F. Kozlovskii ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films

Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition

Vacuum ◽  
2000 ◽  
Vol 59 (2-3) ◽  
pp. 641-648 ◽  
Author(s):  
F.O Adurodija ◽  
H Izumi ◽  
T Ishihara ◽  
H Yoshioka ◽  
H Matsui ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Low Resistivity

Electrochromic properties of antimony tin oxide (ATO) thin films synthesized by pulsed laser deposition

2001 ◽  
Vol 46 (13-14) ◽  
pp. 2097-2104 ◽  
Author(s):  
C Marcel ◽  
M.S Hegde ◽  
A Rougier ◽  
C Maugy ◽  
C Guéry ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Electrochromic Properties ◽  
Antimony Tin Oxide
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