Evaluation of the dual exposure technique

2001 ◽  
Author(s):  
Harry Sewell ◽  
Victor F. Bunze ◽  
Nicholas DeLuca ◽  
Diane C. McCafferty
Keyword(s):  
Exposure Technique

Molecular Structure of the Outermost Cell Wall Component of Spirillum Serpens

1977 ◽  
Vol 35 ◽  
pp. 342-343
Author(s):  
Wah Chiu ◽  
David Grano
Keyword(s):  
Molecular Structure ◽  
Cell Wall ◽  
Outer Membrane ◽  
Gel Electrophoresis ◽  
Electron Microscopic Examination ◽  
Electron Microscopic ◽  
Cell Wall Component ◽  
Protein Components ◽  
Exposure Technique ◽  
Structural Aspects

The periodic structure external to the outer membrane of Spirillum serpens VHA has been isolated by similar procedures to those used by Buckmire and Murray (1). From SDS gel electrophoresis, we have found that the isolated fragments contain several protein components, and that the crystalline structure is composed of a glycoprotein component with a molecular weight of ∽ 140,000 daltons (2). Under an electron microscopic examination, we have visualized the hexagonally-packed glycoprotein subunits, as well as the bilayer profile of the outer membrane. In this paper, we will discuss some structural aspects of the crystalline glycoproteins, based on computer-reconstructed images of the external cell wall fragments.The specimens were prepared for electron microscopy in two ways: negatively stained with 1% PTA, and maintained in a frozen-hydrated state (3). The micrographs were taken with a JEM-100B electron microscope with a field emission gun. The minimum exposure technique was essential for imaging the frozen- hydrated specimens.

Double Patterning Analysis Method by Emulation Using a Double-Exposure Technique

2010 ◽  
Vol 49 (3) ◽  
pp. 035201
Author(s):  
Junji Miyazaki ◽  
Nobuhito Toyama ◽  
Akira Kawai
Keyword(s):  
Analysis Method ◽  
Double Exposure ◽  
Double Patterning ◽  
Exposure Technique

Fabrication and Testing of Hard X-Ray Hourglass Lenses

2009 ◽  
Vol 60-61 ◽  
pp. 175-179
Author(s):  
Jing Qiu Liang ◽  
Yan Qing Zhu ◽  
Nai Di Cui ◽  
Zhong Zhu Liang ◽  
Zhi Chun Le ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Relative Intensity ◽  
One Dimension ◽  
Structure Parameters ◽  
X Ray ◽  
Beijing Synchrotron Radiation Facility ◽  
Exposure Technique

Based on the refraction theory of the lens, the SU-8 photoresist hard X-ray hourglass lenses with three different structure parameters are fabricated. The mask-back exposure technique is introduced to fabricate the lenses. The focusing performance of this device is tested at Beijing Synchrotron Radiation Facility (BSRF). At the distance of 1.65m from the lenses, an obviously focusing performance in one dimension is observed. The relative intensity of the lenses with the largest gain is about 217.7, the gain of the lens is about 1.15, and the dimension of the focus is about 33µm. The focusing performance of this device can be improved through the developing of the mask-back exposure technique.

scholarly journals Sparse-exposure technique in holographic two-photon polymerization

2008 ◽  
Vol 16 (21) ◽  
pp. 16592 ◽  
Author(s):  
Hidetomo Takahashi ◽  
Satoshi Hasegawa ◽  
Akihiro Takita ◽  
Yoshio Hayasaki
Keyword(s):  
Two Photon ◽  
Exposure Technique ◽  
Two Photon Polymerization

Pigmented Villonodular Synovitis of the Elbow Treated with the Tsuge Wide Joint Exposure Technique

Orthopedics ◽  
2010 ◽  
Vol 33 (2) ◽  
pp. 122-124 ◽  
Author(s):  
Shuichi Chida ◽  
Kyoji Okada ◽  
Shu Takahashi ◽  
Hiroyuki Nagasawa ◽  
Hiroshi Sasaki ◽  
...  
Keyword(s):  
Pigmented Villonodular Synovitis ◽  
Villonodular Synovitis ◽  
Exposure Technique ◽  
Pigmented Villonodular
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