Model-based proximity effect correction for electron-beam direct-write lithography

2010 ◽  
Author(s):  
Chun-Hung Liu ◽  
Pei-Lin Tien ◽  
Philip C. W. Ng ◽  
Yu-Tian Shen ◽  
Kuen-Yu Tsai
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Direct Write ◽  
Model Based ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7546-7551 ◽  
Author(s):  
Takashi Kamikubo ◽  
Takayuki Abe ◽  
Susumu Oogi ◽  
Hiroto Anze ◽  
Mitsuko Shimizu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Correction Method ◽  
Proximity Effect Correction
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