Reflective electron-beam lithography: progress toward high-throughput production capability

2012 ◽  
Author(s):  
Regina Freed ◽  
Thomas Gubiotti ◽  
Jeff Sun ◽  
Francoise Kidwingira ◽  
Jason Yang ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Production Capability

Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Nanoscale ◽  
2020 ◽  
Vol 12 (19) ◽  
pp. 10584-10591 ◽  
Author(s):  
You Sin Tan ◽  
Hailong Liu ◽  
Qifeng Ruan ◽  
Hao Wang ◽  
Joel K. W. Yang
Keyword(s):  
Electron Beam ◽  
Plasma Treatment ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Large Area ◽  
Post Exposure ◽  
Closed Polygon

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

2002 ◽  
Author(s):  
David R. Medeiros ◽  
Karen E. Petrillo ◽  
James Bucchignano ◽  
Marie Angelopoulos ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Mask Making
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