On the Possibility of Applying Fluoride Neodymium-Activated Crystals as Light-Controlled Gates for ArF Laser Radiation (193 nm)

The fluorescence spectra of four optical materials (S1-UV quartz, UV grade sapphire, MgF2, and BaF2) have been recorded using ArF laser radiation at 193 nm (6.4 eV) as an excitation source. The time-resolved fluorescence intensities have also been measured at several wavelengths using a transient digitizer with 2 ns resolution. All of the materials exhibit a fast fluorescence which follows the exciting laser pulse and has a lifetime τR < 7 ± 2 ns. This fast fluorescence is present as a broad continum from 200 to 1000 nm with maxima in the UV and the IR. In addition, there are fluorescence components with longer lifetimes which are characteristic of the individual materials. The results suggest further opportunities for study of optical materials using ArF lasers and indicate an area of caution to be exercised by experimentalists employing ArF lasers for excitation experiments.

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Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

Electronics Letters ◽

10.1049/el:19940780 ◽

1994 ◽

Vol 30 (14) ◽

pp. 1133-1134 ◽

Cited By ~ 20

Author(s):

P. E. Dyer ◽

K. C. Byron ◽

R. J. Farley ◽

R. Giedl

Keyword(s):

Bragg Grating ◽

Fibre Bragg Grating ◽

Arf Laser ◽

193 Nm

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CARS and Fluorescent study of ignition of H2/O2 mixtures upon photodissociation of O2 molecular

MATEC Web of Conferences ◽

10.1051/matecconf/201820900010 ◽

2018 ◽

Vol 209 ◽

pp. 00010

Author(s):

Vitaly Kobtsev ◽

Sergey Kostritsa ◽

Dmitrii Kozlov ◽

Alexey Pelevkin ◽

Valery Smirnov ◽

...

Keyword(s):

Laser Radiation ◽

Combustion Chamber ◽

Test Bench ◽

Combustion Process ◽

Kinetic Mechanism ◽

Uv Laser ◽

Chain Reactions ◽

Ignition And Combustion ◽

193 Nm ◽

Experimental Test Bench

The research is devoted to gas mixtures ignition by UV laser radiation. The dissociation of O2 molecules by a pulse of excimer ArF laser radiation at 193-nm wavelength with formation of the chemically active oxygen atoms initiating chain reactions which cause ignition of H2/O2 mixture was employed. The experimental test bench was created with CARS and fluorescent techniques for experimental investigation of some peculiarities of mixture ignition and combustion caused by such photo-dissociation, at conditions typical for combustion chamber. Two-dimensional numerical modeling of combustion process in model combustion chamber, based on kinetic mechanism of H2 oxidation including atom O(1P) and radicals OH(A2Σ+), was performed.

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Laser etching of quartz and teflon with 157 nm and 193 nm laser radiation

10.1063/1.44873 ◽

1993 ◽

Cited By ~ 1

Author(s):

Peter R. Herman ◽

Boyi Chen ◽

J. David Moore

Keyword(s):

Laser Radiation ◽

Laser Etching ◽

193 Nm

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193 nm ArF laser ablation and patterning of chitosan thin films

Applied Physics A ◽

10.1007/s00339-018-1859-z ◽

2018 ◽

Vol 124 (6) ◽

Cited By ~ 2

Author(s):

A. A. Aesa ◽

C. D. Walton

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Arf Laser ◽

193 Nm

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Trace Detection of Nitrocompounds by ArF Laser Photofragmentation/Ionization Spectrometry

Applied Spectroscopy ◽

10.1366/0003702934066190 ◽

1993 ◽

Vol 47 (11) ◽

pp. 1907-1912 ◽

Cited By ~ 32

Author(s):

Josef B. Simeonsson ◽

George W. Lemire ◽

Rosario C. Sausa

Keyword(s):

Ground State ◽

Multiphoton Ionization ◽

Ionization Mass ◽

Trace Detection ◽

Atmospheric Conditions ◽

Experimental Conditions ◽

Detection Range ◽

Arf Laser ◽

Free Environment ◽

193 Nm

A new method for detecting trace vapors of NO2-containing compounds near atmospheric conditions has been demonstrated with the use of one-color-laser photofragmentation/ionization spectrometry. An ArF laser is employed to both photolytically fragment the target molecules in a collision-free environment and ionize the characteristic NO fragments. The production of NO is hypothesized to result from a combination of two NO2 unimolecular fragmentation pathways, one yielding NO in its X2II electronic ground state and the other in its A2Σ+ excited state. Ionization of ground-state NO molecules is accomplished by resonance-enhanced multiphoton ionization processes via its A2Σ+ ← X2II (3, 0), B2II ← X2II (7, 0) and/or D2Σ+ ← X2II (0, 1) bands at 193 nm. The analytical utility of this method is demonstrated in a molecular beam time-of-flight apparatus. Limits of detection range from the parts-per-million (ppm) to parts-per-billion (ppb) level for NO, NO2, CH3NO2, dimethylnitramine (DMNA), ortho- and meta-nitrotoluene, nitrobenzene, and trinitrotoluene (TNT). Under effusive beam experimental conditions, discrimination between structural isomers, ortho-nitrotoluene and meta-nitrotoluene, has been demonstrated with the use of their characteristic photofragmentation/ionization mass spectra.

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