Mechanism of the interaction between Al2O3 and SiO2 during the chemical-mechanical polishing of sapphire with silicon dioxide

2012 ◽  
Vol 6 (1) ◽  
pp. 115-121 ◽  
Author(s):  
E. A. Vovk ◽  
A. T. Budnikov ◽  
M. V. Dobrotvorskaya ◽  
S. I. Krivonogov ◽  
A. Ya. Dan’ko
Keyword(s):  
Silicon Dioxide ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing

Growth of GaN on Thin SI {111} Layers Bonded to SI {100} Substrates

1998 ◽  
Vol 535 ◽  
Author(s):  
J. G. Fleming ◽  
Jung Han
Keyword(s):  
Silicon Nitride ◽  
Silicon Dioxide ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Thin Layers

AbstractWe have demonstrated the ability to bond thin layers of Si {111} onto either silicon dioxide or silicon nitride coated Si {100}. This was achieved using a “Smart-Cut” process. The integration of SiN required chemical mechanical polishing. The growth of GaN on a thin Si {111} on oxide on Si {100} stack was demonstrated.

Comparison of Ceria Nanoparticle Concentrations in Effluent from Chemical Mechanical Polishing of Silicon Dioxide

2014 ◽  
Vol 48 (22) ◽  
pp. 13427-13433 ◽  
Author(s):  
Larry Zazzera ◽  
Brian Mader ◽  
Mark Ellefson ◽  
Jess Eldridge ◽  
Steve Loper ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing
Sign in / Sign up

Export Citation Format

Share Document