Modification of dielectric films in MIS structures using the injection-thermal treatment

2015 ◽  
Vol 6 (2) ◽  
pp. 128-132 ◽  
Author(s):  
V. V. Andreev ◽  
G. G. Bondarenko ◽  
A. A. Stolyarov ◽  
D. M. Akhmelkin
Keyword(s):  
Thermal Treatment ◽  
Dielectric Films ◽  
Mis Structures

Investigation of Injection- and Radiation-Thermal Processes in Thin Gate Dielectric Films of MIS Structures

2018 ◽  
Vol 781 ◽  
pp. 47-52
Author(s):  
Dmitrii Andreev ◽  
Gennady Bondarenko ◽  
Vladimir Andreev ◽  
Alexander Stolyarov
Keyword(s):  
Thermal Treatment ◽  
High Field ◽  
Gate Dielectric ◽  
Dielectric Film ◽  
Dielectric Films ◽  
Mis Structure ◽  
Thermal Processes ◽  
Structure Modification ◽  
Dioxide Film ◽  
Mis Structures

In order to modify the gate dielectric of MIS structures we suggest to implement the injection-thermal treatment which consists in the high-field injection of electrons of set density into the thin dielectric film and the subsequent annealing of the structure. We investigate an influence of modes of the injection-thermal treatment onto the modification of MIS structures. We demonstrate that the processes of MIS structure modification taking place at the injection-thermal treatment in many respects are identical to the processes taking place at the radiation-thermal treatment. We study an influence of modes of the high-field electron injection into the gate dielectric of MIS structure onto densities of charge defects and the injection hardness of samples. Besides, we research an influence of doping of the silicone dioxide film by phosphorus onto the same characteristics.

Increasing the Charge Stability of Gate Dielectric Films of MIS Structures by Doping Them with Phosphorus

2021 ◽  
Vol 12 (2) ◽  
pp. 517-520
Author(s):  
D. V. Andreev ◽  
G. G. Bondarenko ◽  
V. V. Andreev ◽  
A. A. Stolyarov
Keyword(s):  
Gate Dielectric ◽  
Dielectric Films ◽  
Charge Stability ◽  
Mis Structures

Method of stress and measurement modes for research of thin dielectric films of MIS structures

2016 ◽  
Author(s):  
Vladimir V. Andreev ◽  
Vladimir M. Maslovsky ◽  
Dmitrii V. Andreev ◽  
Alexander A. Stolyarov
Keyword(s):  
Dielectric Films ◽  
Thin Dielectric Films ◽  
Mis Structures

scholarly journals Simulation of charge processes in dielectric films of MIS structures at simultaneous influence by ionization and high-field injection of electrons

2019 ◽  
Vol 37 ◽  
pp. 279-285 ◽  
Author(s):  
Dmitrii V. Andreev ◽  
Gennady G. Bondarenko ◽  
Vladimir V. Andreev ◽  
Alexander A. Stolyarov
Keyword(s):  
High Field ◽  
Dielectric Films ◽  
Simultaneous Influence ◽  
Mis Structures

Pollutant Identification by Selected Area Electron Diffraction

1974 ◽  
Vol 32 ◽  
pp. 532-533
Author(s):  
R. E. Ferrell ◽  
G. G. Paulson ◽  
C. W. Walker
Keyword(s):  
Thermal Treatment ◽  
Electron Diffraction ◽  
Sample Preparation ◽  
Crystal Structures ◽  
Water Samples ◽  
Environmental Samples ◽  
Short Review ◽  
Selected Area Electron Diffraction ◽  
Multiple Component

Selected area electron diffraction (SAD) has been used successfully to determine crystal structures, identify traces of minerals in rocks, and characterize the phases formed during thermal treatment of micron-sized particles. There is an increased interest in the method because it has the potential capability of identifying micron-sized pollutants in air and water samples. This paper is a short review of the theory behind SAD and a discussion of the sample preparation employed for the analysis of multiple component environmental samples.

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