OTHER RF POWER SOURCES

Author(s):  
G.Ya. KURKIN
Keyword(s):  
Rf Power ◽  
2009 ◽  
Vol 6 (S1) ◽  
pp. S582-S587 ◽  
Author(s):  
Sandro Jatta ◽  
Klaus Haberle ◽  
Andreas Klein ◽  
Robert Schafranek ◽  
Benjamin Koegel ◽  
...  

Author(s):  
Mark F. Kirshner ◽  
Richard D. Kowalczyk ◽  
Craig B. Wilsen ◽  
Richard B. True ◽  
Ian T. Simpson ◽  
...  
Keyword(s):  
Rf Power ◽  

Author(s):  
Stefan Schmickl ◽  
Thomas Faseth ◽  
Harald Pretl

AbstractIoT devices become more and more popular which implies a growing interest in easily maintainable and battery-independent power sources, as wires and batteries are unpractical in application scenarios where billions of devices get deployed. To keep the costs low and to achieve the smallest possible form factor, SoC implementations with integrated energy harvesting and power management units are a welcome innovation.On-chip energy harvesting solutions are typically only capable of supplying power in the order of microwatts. A significant design challenge exists for the functional blocks of the IoT-SoC as well as for the power management unit itself as the harvested voltage has to be converted to a higher and more usable voltage. Simultaneously, the power management blocks have to be as efficient as possible with the lowest possible quiescent currents.In this paper, we provide a look at on-chip microwatt power management. Starting with the energy-harvesting from RF power or light, we then show state-of-the-art implementations of ultra-low power voltage references and ultra-low power low-dropout regulator (LDO) designs.


Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.


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