Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique

1990 ◽  
Vol 29 (Part 1, No. 10) ◽  
pp. 2247-2250 ◽  
Author(s):  
Takashi Fuyuki ◽  
Takashi Saitoh ◽  
Hiroyuki Matsunami
2020 ◽  
Vol 51 (S1) ◽  
pp. 180-183
Author(s):  
Yang Miao ◽  
Jiajia Qian ◽  
Jinchuan Li ◽  
Zhongguo Yang ◽  
Yanying Du ◽  
...  

2011 ◽  
Vol 26 (1) ◽  
pp. 12-16 ◽  
Author(s):  
Xiong-Fei ZHENG ◽  
Wen-Jie ZHAI ◽  
Ying-Chun LIANG ◽  
Tao SUN

2021 ◽  
Vol 204 ◽  
pp. 114152
Author(s):  
Jing Yan ◽  
Jun Ouyang ◽  
Hongbo Cheng ◽  
Peng Yan

1989 ◽  
Vol 54 (4) ◽  
pp. 383-385 ◽  
Author(s):  
K. Mizuno ◽  
M. Miyauchi ◽  
K. Setsune ◽  
K. Wasa

Sign in / Sign up

Export Citation Format

Share Document