Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique
1990 ◽
Vol 29
(Part 1, No. 10)
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pp. 2247-2250
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Keyword(s):
1995 ◽
Vol 13
(6)
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pp. 2924-2929
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2011 ◽
Vol 26
(1)
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pp. 12-16
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1997 ◽
Vol 15
(4)
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pp. 1951-1954
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2008 ◽
Vol 202
(10)
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pp. 2126-2131
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