Effects of Oxygen Addition on Diamond Film Growth by Electron-Cyclotron-Resonance Microwave Plasma CVD Apparatus

Film Growth ◽

Microwave Plasma ◽

Plasma Cvd ◽

Microwave Plasma Cvd ◽

Oxygen Addition ◽

Diamond Film Growth ◽

Ultra-smooth and hydrophobic nitrogen-incorporated ultranano-crystalline diamond film growth in C-H-O-N gas phase system via microwave plasma CVD

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.06.017 ◽

2019 ◽

Vol 374 ◽

pp. 409-417 ◽

Cited By ~ 2

Author(s):

Yuting Zheng ◽

Jinlong Liu ◽

Junjun Wei ◽

Liangxian Chen ◽

Zhengcheng Li ◽

...

Keyword(s):

Gas Phase ◽

Diamond Film ◽

Film Growth ◽

Microwave Plasma ◽

Phase System ◽

Plasma Cvd ◽

Microwave Plasma Cvd ◽

Diamond Film Growth

Enhanced diamond film growth by Xe-added microwave plasma CVD

Thin Solid Films ◽

10.1016/s0040-6090(00)00780-x ◽

2000 ◽

Vol 368 (2) ◽

pp. 269-274 ◽

Cited By ~ 5

Author(s):

Takeshi Hosomi ◽

Tetsuro Maki ◽

Takeshi Kobayashi

Keyword(s):

Diamond Film ◽

Film Growth ◽

Microwave Plasma ◽

Plasma Cvd ◽

Microwave Plasma Cvd ◽

Diamond Film Growth

Diamond thin film growth on silicon at temperatures between 500 and 600 °C using an electron cyclotron resonance microwave plasma source

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90129-k ◽

1991 ◽

Vol 48 (1) ◽

pp. 69-79 ◽

Cited By ~ 27

Author(s):

C.R. Eddy ◽

B.D. Sartwell ◽

D.L. Youchison

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Film Growth ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Thin Film Growth ◽

Diamond Thin Film ◽

Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Synthesis of Microwave Plasma CVD Diamond-Film on Variously-Coated Carbon-Steel Substrates.

Journal of The Surface Finishing Society of Japan ◽

10.4139/sfj.47.611 ◽

1996 ◽

Vol 47 (7) ◽

pp. 611-615

Author(s):

Hiroyuki TANAKA ◽

Toshiaki TANAKA ◽

Hideaki SOHMA ◽

Masato YOSHIDA ◽

Akira SAKAI ◽

...

Keyword(s):

Carbon Steel ◽

Diamond Film ◽

Microwave Plasma ◽

Cvd Diamond ◽

Plasma Cvd ◽

Microwave Plasma Cvd ◽

Cvd Diamond Film ◽

Steel Substrates ◽

Coated Carbon

Kinetic modeling of microscopic processes during electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxial growth of GaN/GaAs‐based heterostructures

Applied Physics Letters ◽

10.1063/1.115682 ◽

1996 ◽

Vol 68 (11) ◽

pp. 1510-1512 ◽

Cited By ~ 20

Author(s):

Z. Z. Bandić ◽

R. J. Hauenstein ◽

M. L. O’Steen ◽

T. C. McGill

Keyword(s):

Epitaxial Growth ◽

Kinetic Modeling ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Molecular Beam Epitaxial ◽

Molecular Beam Epitaxial Growth ◽

New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror

Applied Physics Letters ◽

10.1063/1.101310 ◽

1989 ◽

Vol 54 (17) ◽

pp. 1645-1647 ◽

Cited By ~ 13

Author(s):

Morito Matsuoka ◽

Ken’ichi Ono

Keyword(s):

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

High Rate ◽

Electron-Cyclotron-Resonance Microwave Plasma Oxidation of Er1Ba2Cu3OySuperconductive Ceramics

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l411 ◽

1988 ◽

Vol 27 (Part 2, No. 3) ◽

pp. L411-L413 ◽

Cited By ~ 5

Author(s):

Shoichiro Minomo ◽

Michio Taniguchi ◽

Yuji Ishida ◽

Masato Sugiyo ◽

Tetsuro Takahashi ◽

...

Keyword(s):

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Low temperature limits of diamond film growth by microwave plasma-assisted CVD

Diamond and Related Materials ◽

10.1016/0925-9635(95)00349-5 ◽

1996 ◽

Vol 5 (3-5) ◽

pp. 226-230 ◽

Cited By ~ 55

Author(s):

J. Stiegler ◽

T. Lang ◽

M. Nyga˚rd-Ferguson ◽

Y. von Kaenel ◽

E. Blank

Keyword(s):

Low Temperature ◽

Diamond Film ◽

Film Growth ◽

Microwave Plasma ◽

Diamond Film Growth