Low temperature limits of diamond film growth by microwave plasma-assisted CVD

1996 ◽  
Vol 5 (3-5) ◽  
pp. 226-230 ◽  
Author(s):  
J. Stiegler ◽  
T. Lang ◽  
M. Nyga˚rd-Ferguson ◽  
Y. von Kaenel ◽  
E. Blank
Keyword(s):  
Low Temperature ◽  
Diamond Film ◽  
Film Growth ◽  
Microwave Plasma ◽  
Diamond Film Growth

Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 264-266 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Ken-ichi Kadota ◽  
Toshimichi Ito ◽  
Akio Hiraki
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Diamond Film Growth

Effects of Oxygen Addition on Diamond Film Growth by Electron-Cyclotron-Resonance Microwave Plasma CVD Apparatus

1991 ◽  
Vol 30 (Part 2, No. 7A) ◽  
pp. L1199-L1202 ◽  
Author(s):  
Masayuki Nunotani ◽  
Masaaki Komori ◽  
Masahiro Yamasawa ◽  
Yasufumi Fujiwara ◽  
Ken Sakuta ◽  
...  
Keyword(s):  
Diamond Film ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Film Growth ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Oxygen Addition ◽  
Diamond Film Growth ◽  
Resonance Microwave

Enhanced diamond film growth by Xe-added microwave plasma CVD

2000 ◽  
Vol 368 (2) ◽  
pp. 269-274 ◽  
Author(s):  
Takeshi Hosomi ◽  
Tetsuro Maki ◽  
Takeshi Kobayashi
Keyword(s):  
Diamond Film ◽  
Film Growth ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Diamond Film Growth
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