Kinetic modeling of microscopic processes during electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxial growth of GaN/GaAs‐based heterostructures

Microwave Plasma ◽

Electron Cyclotron ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Microscopic processes during electron cyclotron resonance microwave nitrogen plasma-assisted molecular beam epitaxial growth of GaN/GaAs heterostructures: Experiments and kinetic modeling

10.1116/1.588940 ◽

1996 ◽

Vol 14 (4) ◽

pp. 2948 ◽

Cited By ~ 4

Author(s):

Z. Z. Bandić

Keyword(s):

Epitaxial Growth ◽

Kinetic Modeling ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Nitrogen Plasma ◽

Electron Cyclotron ◽

Gas Source Molecular Beam Epitaxial Growth of GaN$_{{\bf 1}-{\ninmbi x}}$P x ($\mbi{x} \Leq {\bf 0.015}$) Using Ion-Removed Electron Cyclotron Resonance Radical Cell

10.1143/jjap.35.l1634 ◽

1996 ◽

Vol 35 (Part 2, No. 12B) ◽

pp. L1634-L1637 ◽

Cited By ~ 31

Author(s):

Kakuya Iwata ◽

Hajime Asahi ◽

Kumiko Asami ◽

Shun-ichi Gonda

Keyword(s):

Epitaxial Growth ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron ◽

Gas Source ◽

Molecular Beam Epitaxial Growth

P-Type ZnSe:N Prepared by Electron Cyclotron Resonance Radical Beam Doping during Molecular Beam Epitaxial Growth

10.1143/jjap.32.l233 ◽

1993 ◽

Vol 32 (Part 2, No. 2B) ◽

pp. L233-L235 ◽

Cited By ~ 24

Author(s):

Takeo Ohtsuka ◽

Kayoko Horie

Keyword(s):

Epitaxial Growth ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron ◽

P Type

Growth of gallium nitride thin films by electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxy

Journal of Applied Physics ◽

10.1063/1.353870 ◽

1993 ◽

Vol 73 (1) ◽

pp. 448-455 ◽

Cited By ~ 82

Author(s):

C. R. Eddy ◽

T. D. Moustakas ◽

J. Scanlon

Keyword(s):

Thin Films ◽

Gallium Nitride ◽

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Observation of Electron-Cyclotron-Resonance Plasma-Excited Molecular Beam Epitaxial Growth of GaN by Optical Emission Spectroscopy.

Shinku ◽

10.3131/jvsj.42.530 ◽

1999 ◽

Vol 42 (4) ◽

pp. 530-534

Author(s):

Yasuo CHIBA ◽

Tatsuya TOMINARI ◽

Yasushi NANISHI

Keyword(s):

Epitaxial Growth ◽

Cyclotron Resonance ◽

Emission Spectroscopy ◽

Molecular Beam ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Resonance Plasma

Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror

Applied Physics Letters ◽

10.1063/1.101310 ◽

1989 ◽

Vol 54 (17) ◽

pp. 1645-1647 ◽

Cited By ~ 13

Author(s):

Morito Matsuoka ◽

Ken’ichi Ono

Keyword(s):

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

High Rate ◽

Electron-Cyclotron-Resonance Microwave Plasma Oxidation of Er1Ba2Cu3OySuperconductive Ceramics

10.1143/jjap.27.l411 ◽

1988 ◽

Vol 27 (Part 2, No. 3) ◽

pp. L411-L413 ◽

Cited By ~ 5

Author(s):

Shoichiro Minomo ◽

Michio Taniguchi ◽

Yuji Ishida ◽

Masato Sugiyo ◽

Tetsuro Takahashi ◽

...

Keyword(s):

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Poly‐Si etching using electron cyclotron resonance microwave plasma sources with multipole confinement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578242 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1295-1302 ◽

Cited By ~ 4

Author(s):

S. M. Gorbatkin ◽

L. A. Berry ◽

John Swyers

Keyword(s):

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Sources ◽