`NOWEL-2' Variable-Shaped Electron Beam Lithography System for 0.1 µm Patterns with Refocusing and Eddy Current Compensation

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4241-4247 ◽  
Author(s):  
Nobuyuki Yasutake ◽  
Yasushi Takahashi ◽  
Yoshihisa Oae ◽  
Akio Yamada ◽  
Jun-ichi Kai ◽  
...  
Keyword(s):  
Electron Beam ◽  
Eddy Current ◽  
Electron Beam Lithography ◽  
Current Compensation ◽  
Lithography System

Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6012-6017 ◽  
Author(s):  
Hiroshi Yasuda ◽  
Soichiro Arai ◽  
Jun-ichi Kai ◽  
Yoshihisa Ooae ◽  
Tomohiko Abe ◽  
...  
Keyword(s):  
Electron Beam ◽  
Fast Electron ◽  
Electron Beam Lithography ◽  
Fast Electron Beam ◽  
Aperture Array ◽  
Lithography System

In situ patterning of organic molecules in aqueous solutions using an inverted electron-beam lithography system

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GL07 ◽  
Author(s):  
Hiroki Miyazako ◽  
Kazuhiko Ishihara ◽  
Kunihiko Mabuchi ◽  
Takayuki Hoshino
Keyword(s):  
Electron Beam ◽  
Aqueous Solutions ◽  
Electron Beam Lithography ◽  
Organic Molecules ◽  
Lithography System

Variably shaped electron beam lithography system, EB55: I. System design

1981 ◽  
Vol 19 (4) ◽  
pp. 941-945 ◽  
Author(s):  
M. Fujinami ◽  
T. Matsuda ◽  
K. Takamoto ◽  
H. Yoda ◽  
T. Ishiga ◽  
...  
Keyword(s):  
Electron Beam ◽  
System Design ◽  
Electron Beam Lithography ◽  
Lithography System
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