Analysis of The Threshold Voltage Adjustment and Floating Body Effect Suppression for0.1 µmFully Depleted SOI-MOSFET

1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1563-1568
Author(s):  
Risho Koh ◽  
Hiroshi Matsumoto
2002 ◽  
Author(s):  
Risho Koh ◽  
Yukishige Saito ◽  
Hisashi Takemura ◽  
Kohichi Arai ◽  
Mitsuru Narihiro ◽  
...  

2004 ◽  
Vol 114-115 ◽  
pp. 264-268 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  

2016 ◽  
Vol 15 (2) ◽  
pp. 537-544 ◽  
Author(s):  
Ali A. Orouji ◽  
Atefeh Rahimifar ◽  
Mohammad Jozi

2008 ◽  
Vol 3 (2) ◽  
pp. 91-95
Author(s):  
Paula G. D. Agopian ◽  
João Antonio Martino ◽  
Eddy Simoen ◽  
Cor Claeys

In this work, we explore the gate oxide thickness influence on the Gate Induced Floating Body effect (GIFBE). This study was performed through two-dimensional numerical simulations and electrical measurements. The available devices are from 130nm and 65nm Silicon-On-Insulator (SOI) MOSFET technologies. The GIFBE and threshold voltage are evaluated as function of the gate oxide thickness reduction and an overlap tendency of the first and the second transconductance peaks is observed.


2010 ◽  
Vol 205 (5) ◽  
pp. 1470-1474 ◽  
Author(s):  
Chih-Hao Dai ◽  
Ting-Chang Chang ◽  
Ann-Kuo Chu ◽  
Yuan-Jui Kuo ◽  
Shih-Ching Chen ◽  
...  

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