Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.1809 ◽

1998 ◽

Vol 37 (Part 1, No. 4A) ◽

pp. 1809-1814 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi ◽

Yoshihisa Matsubara ◽

Tadahiko Horiuchi

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Carbon Thin Films

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Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Journal of Applied Physics ◽

10.1063/1.360313 ◽

1995 ◽

Vol 78 (2) ◽

pp. 1370-1372 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Carbon Thin Films

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Amorphous carbon thin films containing benzene rings for use as low-dielectric-constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.118935 ◽

1997 ◽

Vol 70 (19) ◽

pp. 2616-2618 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Benzene Rings ◽

Carbon Thin Films

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Controlling Fluorine Concentration of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l1531 ◽

1997 ◽

Vol 36 (Part 2, No. 11B) ◽

pp. L1531-L1533 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Fluorine Concentration ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Carbon Thin Films

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Nitrogen doped fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.115761 ◽

1996 ◽

Vol 68 (25) ◽

pp. 3656-3658 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Nitrogen Doped ◽

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Thermal Stability of Fluorinated Amorphous Carbon Thin Films with Low Dielectric Constant

Journal of The Electrochemical Society ◽

10.1149/1.1357181 ◽

2001 ◽

Vol 148 (4) ◽

pp. F67 ◽

Author(s):

Sang-Soo Han ◽

Byeong-Soo Bae

Keyword(s):

Thermal Stability ◽

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Carbon Thin Films ◽

Thermal Stability Of

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Effects of double bonding configurations on thermal stability of low-hydrogen concentration fluorinated amorphous carbon thin-films with low dielectric constant prepared by sputtering with hydrogen dilution

Vacuum ◽

10.1016/s0042-207x(00)00346-8 ◽

2000 ◽

Vol 59 (2-3) ◽

pp. 771-776 ◽

Author(s):

H Yokomichi ◽

A Masuda

Keyword(s):

Thermal Stability ◽

Dielectric Constant ◽

Hydrogen Concentration ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Hydrogen Dilution ◽

Carbon Thin Films ◽

Thermal Stability Of

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Effect of sputtering with hydrogen dilution on fluorine concentration of low hydrogen content fluorinated amorphous carbon thin films with low dielectric constant

Journal of Applied Physics ◽

10.1063/1.371078 ◽

1999 ◽

Vol 86 (5) ◽

pp. 2468-2472 ◽

Author(s):

Haruo Yokomichi ◽

Atsushi Masuda

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Hydrogen Content ◽

Low Dielectric Constant ◽

Fluorine Concentration ◽

Low Dielectric ◽

Hydrogen Dilution ◽

Carbon Thin Films

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Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters ◽

10.1063/1.116350 ◽

1996 ◽

Vol 68 (20) ◽

pp. 2864-2866 ◽

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Helicon Plasma ◽

Interlayer Dielectrics ◽

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Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant

Applied Physics Letters ◽

10.1063/1.121105 ◽

1998 ◽

Vol 72 (21) ◽

pp. 2704-2706 ◽

Author(s):

Haruo Yokomichi ◽

Tohru Hayashi ◽

Atsushi Masuda

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Carbon Thin Films

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Deposition of Fluorinated Amorphous Carbon Thin Films as a Low‐Dielectric‐Constant Material

Journal of The Electrochemical Society ◽

10.1149/1.1392482 ◽

1999 ◽

Vol 146 (9) ◽

pp. 3383-3388 ◽

Author(s):

Sang‐Soo Han ◽

Hun Rae Kim ◽

Byeong‐Soo Bae

Keyword(s):

Dielectric Constant ◽

Amorphous Carbon ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Carbon Thin Films

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