Effects of Nitride Lightly-Doped-Drain Spacers on Inter-Metal-Dielectrics-Induced Metal Oxide Semiconductor Field Effect Transistor Degradation under Hot Carrier Stress

2000 ◽  
Vol 39 (Part 2, No. 1A/B) ◽  
pp. L28-L30
Author(s):  
Jengping Lin ◽  
Willie Liu ◽  
Chi-Hui Lin
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Hot Carrier ◽  
Hot Carrier Stress ◽  
Effect Transistor ◽  
Lightly Doped Drain

Hot Carrier Effect in UltraThin Gate Oxide Metal Oxide Semiconductor Field Effect Transistor

2005 ◽  
Vol 44 (8) ◽  
pp. 5889-5892 ◽  
Author(s):  
Yukiharu Uraoka ◽  
Hiroyuki Honda ◽  
Takashi Fuyuki ◽  
Takaoki Sasaki ◽  
Mitsuo Yasuhira
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Gate Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Hot Carrier ◽  
Carrier Effect ◽  
Effect Transistor ◽  
Hot Carrier Effect
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