Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists
2002 ◽
Vol 41
(Part 1, No. 6B)
◽
pp. 4122-4126
2000 ◽
Vol 18
(2)
◽
pp. 681-684
◽
Keyword(s):
Keyword(s):
1985 ◽
Vol 3
(1-4)
◽
pp. 443-450
◽
Keyword(s):
1998 ◽
Vol 16
(6)
◽
pp. 3158
◽
Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.
1996 ◽
Vol 9
(4)
◽
pp. 663-675
◽
2004 ◽
Vol 73-74
◽
pp. 662-665
◽