Effects of N2O Plasma Treatment on the Performance of Excimer-Laser-Annealed Polycrystalline Silicon Thin Film Transistors

2002 ◽  
Vol 41 (Part 1, No. 9) ◽  
pp. 5542-5545 ◽  
Author(s):  
Ching-Lin Fan ◽  
Mao-Chieh Chen
Keyword(s):  
Thin Film ◽  
Plasma Treatment ◽  
Excimer Laser ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film

Threshold voltage of excimer-laser-annealed polycrystalline silicon thin-film transistors

2000 ◽  
Vol 76 (17) ◽  
pp. 2442-2444 ◽  
Author(s):  
C. T. Angelis ◽  
C. A. Dimitriadis ◽  
F. V. Farmakis ◽  
J. Brini ◽  
G. Kamarinos ◽  
...  
Keyword(s):  
Thin Film ◽  
Excimer Laser ◽  
Threshold Voltage ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film

Transconductance of large grain excimer laser-annealed polycrystalline silicon thin film transistors

2000 ◽  
Vol 44 (6) ◽  
pp. 1081-1087 ◽  
Author(s):  
C.T. Angelis ◽  
C.A. Dimitriadis ◽  
F.V. Farmakis ◽  
J. Brini ◽  
G. Kamarinos ◽  
...  
Keyword(s):  
Thin Film ◽  
Excimer Laser ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film

Hysteresis analysis in excimer-laser-annealed low-temperature polycrystalline-silicon thin-film transistors

2012 ◽  
Vol 20 (7) ◽  
pp. 355-359 ◽  
Author(s):  
Yu-Mi Kim ◽  
Kwang-Seok Jeong ◽  
Ho-Jin Yun ◽  
Seung-Dong Yang ◽  
Sang-Youl Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Excimer Laser ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film
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