Electroless Plating with Pd Induced Crystallization of Amorphous Silicon Thin Films

2002 ◽  
Vol 41 (Part 1, No. 11A) ◽  
pp. 6356-6357
Author(s):  
Guo-Ren Hu ◽  
Yew-Chung Sermon Wu ◽  
Chi-Wei Chao ◽  
Tian-Jiun Huang
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Electroless Plating ◽  
Silicon Thin Films ◽  
Induced Crystallization

Electroless Plating Ni Induced Crystallization of Amorphous Silicon Thin Films

2001 ◽  
Vol 40 (Part 1, No. 9A) ◽  
pp. 5244-5246 ◽  
Author(s):  
Ying-Chia Chen ◽  
Yew-Chung Sermon Wu ◽  
Chi-Wei Chao ◽  
Guo-Ren Hu ◽  
Ming-Shiann Feng
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Electroless Plating ◽  
Silicon Thin Films ◽  
Induced Crystallization

Polycrystalline silicon thin films by aluminum induced crystallization of amorphous silicon

2013 ◽  
Vol 264 ◽  
pp. 11-16 ◽  
Author(s):  
T. Wang ◽  
H. Yan ◽  
M. Zhang ◽  
X. Song ◽  
Q. Pan ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films ◽  
Induced Crystallization ◽  
Aluminum Induced Crystallization

Effect of surface morphology on laser-induced crystallization of amorphous silicon thin films

2013 ◽  
Author(s):  
Lu Huang ◽  
Jing Jin ◽  
Guohua Wang ◽  
Weimin Shi ◽  
Weiguang Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Amorphous Silicon ◽  
Silicon Thin Films ◽  
Induced Crystallization ◽  
Effect Of Surface

A Comparative Study on the Electrical Properties of Amorphous Silicon Thin Films in Light-Induced Crystallization

1984 ◽  
Vol 23 (Part 2, No. 10) ◽  
pp. L761-L764
Author(s):  
Z. M. Chen ◽  
Kenji Ebihara ◽  
P. K. John ◽  
B. Y. Tong ◽  
S. K. Wong
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Comparative Study ◽  
Amorphous Silicon ◽  
Silicon Thin Films ◽  
Induced Crystallization

Directional Field Aided Lateral Crystallization of Amorphous Silicon Thin Films

2001 ◽  
Vol 664 ◽  
Author(s):  
Marek A. T. Izmajlowicz ◽  
Neil A. Morrison ◽  
Andrew J. Flewitt ◽  
William I. Milne
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Electric Field ◽  
Amorphous Silicon ◽  
Solid Phase ◽  
Excimer Laser Annealing ◽  
Solid Phase Crystallization ◽  
Metal Induced Crystallization ◽  
Silicon Thin Films ◽  
Induced Crystallization

ABSTRACTFor application to active matrix liquid crystal displays (AMLCDs), a low temperature (< 600 °C) process for the production of polycrystalline silicon is required to permit the use of inexpensive glass substrates. This would allow the integration of drive electronics onto the display panel. Current low temperature processes include excimer laser annealing, which requires expensive equipment, and solid phase crystallization, which requires high temperatures. It is known that by adding small amounts of metals such as nickel to the amorphous silicon the solid phase crystallization temperature can be significantly reduced. The rate of this solid phase metal induced crystallization is increased in the presence of an electric field. Previous work on field aided crystallization has reported crystal growth that either proceeds towards the positive terminal or is independent of the direction of the electric field. In this work, extensive investigation has consistently revealed directional crystallization, from the positive to the negative terminal, of amorphous silicon thin films during heat treatment in the presence of an electric field. This is the first time that this phenomenon has been reported. Models have been proposed for metal induced crystallization with and without an applied electric field in which a reaction between Ni and Si to produce NiSi is the rate-limiting step. The crystallization rate is increased in the presence of an electric field through the drift of positive Ni ions.

Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H2 plasmas

2006 ◽  
Vol 100 (5) ◽  
pp. 053514 ◽  
Author(s):  
Saravanapriyan Sriraman ◽  
Mayur S. Valipa ◽  
Eray S. Aydil ◽  
Dimitrios Maroudas
Keyword(s):  
Thin Films ◽  
Amorphous Silicon ◽  
Silicon Thin Films ◽  
Induced Crystallization
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